Development and characterization of TiN coatings by ion beam assisted deposition process for improved wear resistance

1995 ◽  
Vol 76-77 ◽  
pp. 437-449 ◽  
Author(s):  
Jeon G. Han ◽  
Joo S. Yoon ◽  
Byung H. Choi ◽  
In S. Choi
Keyword(s):  
Wear Resistance ◽  
Ion Beam ◽  
Deposition Process ◽  
Tin Coatings ◽  
Ion Beam Assisted Deposition

Compositional characterization of CrN films deposited by ion beam-assisted deposition process on stainless steel

2001 ◽  
Vol 388 (1-2) ◽  
pp. 195-200 ◽  
Author(s):  
Sanjiv Kumar ◽  
V.S Raju ◽  
R Shekhar ◽  
J Arunachalam ◽  
A.S Khanna ◽  
...  
Keyword(s):  
Stainless Steel ◽  
Ion Beam ◽  
Deposition Process ◽  
Ion Beam Assisted Deposition ◽  
Compositional Characterization

Characterization of TiN Films Prepared by Ion Beam Assisted Deposition

1988 ◽  
Vol 128 ◽  
Author(s):  
Albert L. Chang ◽  
R. A. Kant
Keyword(s):  
Ion Beam ◽  
Analytical Techniques ◽  
Deposition Process ◽  
Processing Parameters ◽  
Ion Energy ◽  
Tin Films ◽  
Tin Film ◽  
Ion Beam Assisted Deposition ◽  
Nitrogen Ion

ABSTRACTOne of the advantages of the ion beam assisted deposition process is its controllability of the processing parameters such as: ion-to-atom arrival ratio and the ion energy. In this study, the effects of the nitrogen ion energy (from 1 KV to 30KV) on the TiN film morphology and microstructures were systematically investigated as a function of ion-to-atom arrival ratios, using TEM, XTEM, SEM, ESCA and other analytical techniques.

Characterization of TiN Films Prepared by ion Beam Assisted Deposition

1988 ◽  
Vol 140 ◽  
Author(s):  
Albert L. Chang ◽  
R. A. Kant
Keyword(s):  
Ion Beam ◽  
Analytical Techniques ◽  
Deposition Process ◽  
Processing Parameters ◽  
Ion Energy ◽  
Tin Films ◽  
Tin Film ◽  
Ion Beam Assisted Deposition ◽  
Nitrogen Ion

AbstractOne of the advantages of the ion beam assisted deposition process is its controllability of the processing parameters such as: ion-to-atom arrival ratio and the ion energy. In this study, the effects of the nitrogen ion energy (from 1 KV to 30KV) on the TiN film morphology and microstructures were systematically investigated as a function of ion-to-atom arrival ratios, using TEM, XTEM, SEM, ESCA and other analytical techniques.

Optimized screen-printing and SEM-FIB characterization of YSZ thin films for Solid Oxide Fuel Cells and gas sensors devices

2004 ◽  
Vol 822 ◽  
Author(s):  
A. Morata ◽  
A. Tarancón ◽  
G. Dezanneau ◽  
F. Peiró ◽  
J. R. Morante
Keyword(s):  
Experimental Design ◽  
Screen Printing ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Deposition Process ◽  
Technological Parameters ◽  
Significant Information ◽  
Screen Printing Technique ◽  
Final Porosity

AbstractIn the present work, the screen printing technique has been used to deposit thick films of Zr0.84Y016O1.92 (8YSZ). In order to control the final porosity in view of a specific application (SOFCs or gas sensor), an experimental design based on analysis of variances (ANOVA) has been carried out. From this, we were able to determine the influence of several technological parameters on films porosity and grain size. The films obtained have been analysed with both Scanning Electron Microscopy (SEM) and Focused Ion Beam (FIB) combined with SEM. We show that only the combination of experimental design and advanced observation technique such as Focused Ion Beam allowed us to extract significant information for the improvement of the deposition process.

Characterization of magnesium fluoride thin films produced by argon ion beam-assisted deposition

2001 ◽  
Vol 382 (1-2) ◽  
pp. 61-68 ◽  
Author(s):  
L. Dumas ◽  
E. Quesnel ◽  
J.-Y. Robic ◽  
Y. Pauleau
Keyword(s):  
Thin Films ◽  
Ion Beam ◽  
Magnesium Fluoride ◽  
Ion Beam Assisted Deposition ◽  
Argon Ion

Characterization of TiN coatings prepared by ion-beam-enhanced deposition

1991 ◽  
Vol 139 ◽  
pp. 225-229 ◽  
Author(s):  
X.Y. Li ◽  
F.J. Wang ◽  
T.C. Ma ◽  
Y.K. Wang
Keyword(s):  
Ion Beam ◽  
Tin Coatings
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