Preparation of crystalline SiC thin films by plasma-enhanced chemical vapour deposition and by ion beam modification of silicon

1992 ◽  
Vol 11 (1-4) ◽  
pp. 79-82 ◽  
Author(s):  
G. Derst ◽  
S. Kalbitzer ◽  
G. Krötz ◽  
G. Müller
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Ion Beam ◽  
Chemical Vapour ◽  
Ion Beam Modification

Ar stabilisation of the cubic/tetragonal phases of ZrO2 in thin films prepared by ion beam induced chemical vapour deposition

2001 ◽  
Vol 389 (1-2) ◽  
pp. 34-42 ◽  
Author(s):  
J.P Holgado ◽  
J.P Espinós ◽  
F Yubero ◽  
A Justo ◽  
M Ocaña ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Ion Beam ◽  
Chemical Vapour

Preparation of TiO2 and Al2O3 thin films by ion-beam induced chemical vapour deposition

Vacuum ◽  
1994 ◽  
Vol 45 (10-11) ◽  
pp. 1043-1045 ◽  
Author(s):  
D Leinen ◽  
A Fernández ◽  
JP Espinós ◽  
AR González-Elipe
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Ion Beam ◽  
Chemical Vapour

Corrosion resistant ZrO2 thin films prepared at room temperature by ion beam induced chemical vapour deposition

2002 ◽  
Vol 151-152 ◽  
pp. 449-453 ◽  
Author(s):  
J.P. Holgado ◽  
M. Pérez-Sánchez ◽  
F. Yubero ◽  
J.P. Espinós ◽  
A.R. González-Elipe
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Room Temperature ◽  
Vapour Deposition ◽  
Ion Beam ◽  
Chemical Vapour ◽  
Corrosion Resistant

AlN thin films prepared by ion beam induced chemical vapour deposition

1998 ◽  
Vol 317 (1-2) ◽  
pp. 100-104 ◽  
Author(s):  
J.C Sánchez-López ◽  
L Contreras ◽  
A Fernández ◽  
A.R González-Elipe ◽  
J.M Martin ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Ion Beam ◽  
Chemical Vapour

scholarly journals Chemical vapour deposition (CVD) of nickel oxide using the novel nickel dialkylaminoalkoxide precursor [Ni(dmamp′)2] (dmamp′ = 2-dimethylamino-2-methyl-1-propanolate)

RSC Advances ◽  
2021 ◽  
Vol 11 (36) ◽  
pp. 22199-22205
Author(s):  
Rachel L. Wilson ◽  
Thomas J. Macdonald ◽  
Chieh-Ting Lin ◽  
Shengda Xu ◽  
Alaric Taylor ◽  
...  
Keyword(s):  
Thin Films ◽  
Nickel Oxide ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Hole Transport ◽  
Blocking Layer ◽  
The Novel ◽  
Electron Blocking Layer

We describe CVD of nickel oxide (NiO) thin films using a new precursor [Ni(dmamp′)2], synthesised using a readily commercially available dialkylaminoalkoxide ligand (dmamp′), which is applied to synthesis of a hole transport-electron blocking layer.

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