Handbook of Materials Failure Analysis

2020 ◽  
2014 ◽  
Vol 12 (0) ◽  
pp. 181-190 ◽  
Author(s):  
Peng Shi ◽  
Jindong Huo ◽  
Qingmei Wang

2019 ◽  
Vol 95 ◽  
pp. 300-311 ◽  
Author(s):  
Phyu Hnin Thike ◽  
Zhou Xu ◽  
Yuan Cheng ◽  
Ying Jin ◽  
Peng Shi

Author(s):  
John R. Devaney

Occasionally in history, an event may occur which has a profound influence on a technology. Such an event occurred when the scanning electron microscope became commercially available to industry in the mid 60's. Semiconductors were being increasingly used in high-reliability space and military applications both because of their small volume but, also, because of their inherent reliability. However, they did fail, both early in life and sometimes in middle or old age. Why they failed and how to prevent failure or prolong “useful life” was a worry which resulted in a blossoming of sophisticated failure analysis laboratories across the country. By 1966, the ability to build small structure integrated circuits was forging well ahead of techniques available to dissect and analyze these same failures. The arrival of the scanning electron microscope gave these analysts a new insight into failure mechanisms.


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