Effects of deposition temperature on the crystallinity of Ba0.5Sr0.5TiO3 epitaxial thin films integrated on Si substrates by pulsed laser deposition method

2008 ◽  
Vol 34 (4) ◽  
pp. 1017-1021 ◽  
Author(s):  
Eun Mi Kim ◽  
Ja-Young Cho ◽  
Jong Ha Moon ◽  
Won-Jae Lee ◽  
Hong Seung Kim ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Deposition Temperature ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Epitaxial Thin Films ◽  
Deposition Method ◽  
Si Substrates

Growth of PbSe thin films on Si substrates by pulsed laser deposition method

2003 ◽  
Vol 252 (1-3) ◽  
pp. 230-235 ◽  
Author(s):  
Roman T. Rumianowski ◽  
Roman S. Dygdala ◽  
Wojciech Jung ◽  
Waclaw Bala
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Deposition Method ◽  
Si Substrates

Fabrication of SrRuO3 Epitaxial Thin Films on YBa2Cu3Ox / CeO2 / YSZ - Buffered Si Substrates by Pulsed Laser Deposition

2003 ◽  
Vol 786 ◽  
Author(s):  
Takamitsu Higuchi ◽  
Koichi Morozumi ◽  
Setsuya Iwashita ◽  
Masaya Ishida ◽  
Tatsuya Shimoda
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Buffer Layer ◽  
Process Condition ◽  
Pulsed Laser ◽  
High Energy ◽  
Laser Deposition ◽  
Epitaxial Thin Films ◽  
Rocking Curve ◽  
Si Substrates

ABSTRACTPseudocubic SrRuO3 (100) epitaxial thin films were fabricated on Si (100) with a YBa2Cu3Ox / CeO2 / YSZ (yttria-stabilized-zirconia) triple buffer layer ∼ 14 nm thick by pulsed laser deposition (PLD). Reflection high-energy electron diffraction (RHEED) and X-ray diffraction (XRD) revealed that the first buffer layer of YSZ (100) was epitaxially grown on naturally oxidized Si (100) substrates with the process condition of PB (base pressure) = 1×10-Torr, PO2 (oxygen partial pressure) = 5×10- Torr, and Ts (substrate temperature) = 700 °C. Higher deposition rate of YSZ in the range of 0 ∼ 0.6 nm/min brought about better crystallinity with a smaller value of a full-width at half maximum (FWHM) in the YSZ (200) rocking curve. Subsequent deposition of CeO2, YBa2Cu3Ox, and SrRuO3 resulted in an SrRuO3 (100) epitaxial thin film exhibiting good crystallinity with FWHM = 1.7° in the SrRuO3 (200) rocking curve.

scholarly journals Deposition pressure-induced microstructure control and plasmonic property tuning in hybrid ZnO-AgxAu1-x thin films

2021 ◽  
Author(s):  
Robynne Lynne PALDI ◽  
Xing Sun ◽  
Xin Li Phuah ◽  
Juanjuan Lu ◽  
Xinghang Zhang ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Deposition Method ◽  
Hybrid Films ◽  
Deposition Pressure ◽  
Plasmonic Metamaterials ◽  
Film Form

Self-assembled oxide-metallic alloyed nanopillars as hybrid plasmonic metamaterials (e.g., ZnO-AgxAu1-x) in a thin film form are grown using a pulsed laser deposition method. The hybrid films were demonstrated to be...

TbMnO3 epitaxial thin films by pulsed-laser deposition

2005 ◽  
Vol 133 (10) ◽  
pp. 641-645 ◽  
Author(s):  
Yimin Cui ◽  
Chunchang Wang ◽  
Bisong Cao
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Epitaxial Thin Films

scholarly journals Y(Ni, Mn)O3 epitaxial thin films prepared by pulsed laser deposition

2004 ◽  
Vol 201 (10) ◽  
pp. 2385-2389 ◽  
Author(s):  
Yanwei Ma ◽  
M. Guilloux-Viry ◽  
O. Pena ◽  
C. Moure
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Epitaxial Thin Films

Preparation of BiFeO3 thin films by pulsed laser deposition method

2006 ◽  
Vol 16 ◽  
pp. s123-s125 ◽  
Author(s):  
Guan-jun ZHANG ◽  
Jin-rong CHENG ◽  
Rui CHEN ◽  
Sheng-wen YU ◽  
Zhong-yan MENG
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Deposition Method ◽  
Bifeo3 Thin Films
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