Modeling and simulation of urea-water-solution droplet evaporation and thermolysis processes for SCR systems

2016 ◽  
Vol 24 (8) ◽  
pp. 1065-1073 ◽  
Author(s):  
Xubo Gan ◽  
Dongwei Yao ◽  
Feng Wu ◽  
Jiawei Dai ◽  
Lai Wei ◽  
...  
2015 ◽  
Vol 1 (1) ◽  
pp. 80-97 ◽  
Author(s):  
Douglas T. Ryddner ◽  
Mario F. Trujillo

2007 ◽  
Vol 70 (1-4) ◽  
pp. 119-127 ◽  
Author(s):  
Felix Birkhold ◽  
Ulrich Meingast ◽  
Peter Wassermann ◽  
Olaf Deutschmann

2009 ◽  
Vol 27 (1) ◽  
pp. 3-13 ◽  
Author(s):  
Morteza Eslamian ◽  
Mahmoud Ahmed ◽  
Nasser Ashgriz

2004 ◽  
Vol 818 ◽  
Author(s):  
Yoshishige Tsuchiya ◽  
Tatsuya Iwasa ◽  
Atsushi Tanaka ◽  
Ko-Ichi Usami ◽  
Hiroshi Mizuta ◽  
...  

AbstractThis paper reports on a new bottom-up technique of forming silicon nanostructures based on natural aggregation of nanocrystalline (nc) -Si dots in the solution. We first study how the nc-Si dots deposited on the Si substrate get mobile in the solution by simply dipping the substrate with the nc-Si dots on into various solutions. We then demonstrate a solution droplet evaporation method that utilizes aggregation of the dots when we evaporate a solution droplet applied onto the nc-Si dots randomly deposited on the Si substrate. It is shown that the nc-Si dots are assembled well in a droplet of the hydrofluoric acid solution, resulting in various regular patterns on the substrate.


2021 ◽  
Vol 237 ◽  
pp. 116587
Author(s):  
Kristian Krum ◽  
Johanne Allingham ◽  
Stine Poulsen ◽  
Henrik Christensen ◽  
Hamid Hashemi ◽  
...  

2020 ◽  
Vol 192 (7) ◽  
pp. 1233-1252 ◽  
Author(s):  
P. Narasu ◽  
S. Boschmann ◽  
P. Pöschko ◽  
F. Zhao ◽  
E. Gutheil

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