scholarly journals Incorporating element doping and quantum dot embedding effects to enhance the thermoelectric properties of higher manganese silicides

2021 ◽  
Vol 7 (2) ◽  
pp. 377-387
Author(s):  
Qing Wang ◽  
Shiyu Song ◽  
Xiaofeng Yang ◽  
Ziyang Liu ◽  
Yufei Ma ◽  
...  
2021 ◽  
Author(s):  
Lijun Zhao ◽  
Mingyuan Wang ◽  
Jian Yang ◽  
Jiabin Hu ◽  
Yuan Zhu ◽  
...  

Abstract Cu3SbSe4, featuring its earth-abundant, cheap, nontoxic and environmentally-friendly constituent elements, can be considered as a promising intermediate temperature thermoelectric (TE) material. Herein, a series of p-type Bi-doped Cu3Sb1 − xBixSe4 (x = 0-0.04) samples were fabricated through melting and hot pressing (HP) process, and the effects of isovalent Bi-doping on their TE properties were comparatively investigated by experimental and computational methods. TEM analysis indicates that Bi-doped samples consist of Cu3SbSe4 and Cu2 − xSe impurity phases, which is in good agreement with the results of XRD, SEM and XPS. For Bi-doped samples, the reduced electrical resistivity (ρ) caused by the optimized carrier concentrations and enhanced Seebeck coefficient derived from the densities of states near the Fermi level give rise to a high power factor of ~ 1000 µWcm− 1K− 2 at 673 K for the Cu3Sb0.985Bi0.015Se4 sample. Additionally, the multiscale defects of Cu3SbSe4-based materials involving point defects, nanoprecipitates, amorphous phases and grain boundaries can strongly scatter phonons to depress lattice thermal conductivity (κlat), resulting in a low κlat of ~ 0.53 Wm− 1K− 1 and thermal conductivity (κtot) of ~ 0.62 Wm− 1K− 1 at 673 K for the Cu3Sb0.98Bi0.02Se4 sample. As a consequence, a maximum ZT value ~ 0.95 at 673 K is obtained for the Cu3Sb0.985Bi0.015Se4 sample, which is ~ 1.9 times more than that of pristine Cu3SbSe4. This work shows that isovalent heavy-element doping is an effective strategy to optimize thermoelectric properties of copper-based chalcogenides.


2020 ◽  
Vol 59 (7) ◽  
pp. 2544-2544
Author(s):  
Wei Shi ◽  
Sanyin Qu ◽  
Hongyi Chen ◽  
Yanling Chen ◽  
Qin Yao ◽  
...  

2011 ◽  
Vol 41 (6) ◽  
pp. 1450-1455 ◽  
Author(s):  
Guo Liu ◽  
Qingmei Lu ◽  
Xin Zhang ◽  
Jiuxing Zhang ◽  
Yongjun Shi

2009 ◽  
Vol 105 (9) ◽  
pp. 093711 ◽  
Author(s):  
A. Yadav ◽  
K. P. Pipe ◽  
W. Ye ◽  
R. S. Goldman

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