Fabrication of bifacial wafer-scale silicon nanowire arrays with ultra-high aspect ratio through controllable metal-assisted chemical etching

2015 ◽  
Vol 139 ◽  
pp. 437-442 ◽  
Author(s):  
Yumin Liu ◽  
Weiwei Sun ◽  
Yun Jiang ◽  
Xing-Zhong Zhao
2014 ◽  
Vol 24 (1) ◽  
pp. 105-105 ◽  
Author(s):  
Junghoon Yeom ◽  
Daniel Ratchford ◽  
Christopher R. Field ◽  
Todd H. Brintlinger ◽  
Pehr E. Pehrsson

2013 ◽  
Vol 24 (1) ◽  
pp. 106-116 ◽  
Author(s):  
Junghoon Yeom ◽  
Daniel Ratchford ◽  
Christopher R. Field ◽  
Todd H. Brintlinger ◽  
Pehr E. Pehrsson

2021 ◽  
Author(s):  
Marcel Rey ◽  
Fedja Wendisch ◽  
Eric Goerlitzer ◽  
Josing Tang ◽  
Romina Bader ◽  
...  

The combination of metal-assisted chemical etching (MACE) and colloidal lithography allows for the affordable, large-scale and high-throughput synthesis of silicon nanowire (SiNW) arrays. However, many geometric parameters of these arrays...


Langmuir ◽  
2014 ◽  
Vol 30 (34) ◽  
pp. 10290-10298 ◽  
Author(s):  
A. S. Togonal ◽  
Lining He ◽  
Pere Roca i Cabarrocas ◽  
Rusli

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