Helium ion beam lithography on fullerene molecular resists for sub-10nm patterning
2016 ◽
Vol 155
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pp. 74-78
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Xiaoqing Shi
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Philip Prewett
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Ejaz Huq
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Darren M. Bagnall
◽
Alex P.G. Robinson
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...
2021 ◽
Vol 31
(5)
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pp. 1-4
Jay C. LeFebvre
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Shane A. Cybart
2000 ◽
Vol 18
(6)
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pp. 3177
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P. Ruchhoeft
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J. C. Wolfe
2018 ◽
Vol 193
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pp. 18-22
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Andrea Cattoni
◽
Dominique Mailly
◽
Olivier Dalstein
◽
Marco Faustini
◽
Gediminas Seniutinas
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...
Nima Kalhor
◽
Wouter Mulckhuyse
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Paul Alkemade
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Diederik Maas
2020 ◽
Vol 31
(46)
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pp. 465302
Chenyi Zhang
◽
Jinxin Li
◽
Alex Belianinov
◽
Zhao Ma
◽
C Kyle Renshaw
◽
...
Chien-Lin Lee
◽
Jia-Syun Cai
◽
Sheng-Wei Chien
◽
Kuen-Yu Tsai
2020 ◽
Vol 12
(17)
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pp. 19616-19624
◽
Rudra Kumar
◽
Manvendra Chauhan
◽
Mohamad G. Moinuddin
◽
Satinder K. Sharma
◽
Kenneth E. Gonsalves
Yunsheng Deng
◽
Xin Zhuang
◽
Wu Wang
◽
Rui Gu
◽
Dongsheng He
◽
...
Xiaoqing Shi
◽
Stuart A. Boden
2020 ◽
Vol 2
(12)
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pp. 3805-3817
Nagarjuna Ravi Kiran
◽
Manvendra Chauhan
◽
Satinder K. Sharma
◽
Subrata Ghosh
◽
Kenneth E. Gonsalves