International Conference on Extreme Ultraviolet Lithography 2019
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TOTAL DOCUMENTS

51
(FIVE YEARS 51)

H-INDEX

2
(FIVE YEARS 2)

Published By SPIE

9781510629974, 9781510629981
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Predicting stochastic defects across the process window

2019 ◽  
Author(s):  
Andreas Frommhold ◽  
Dorin Cerbu ◽  
Joost Bekaert ◽  
Lieve Van Look ◽  
Mark J. Maslow ◽  
...  
Keyword(s):  
Process Window

Measuring the Phase of EUV Photomasks

2019 ◽  
Author(s):  
Stuart Sherwin ◽  
Isvar Cordova ◽  
Laura Waller ◽  
Andrew Neureuther ◽  
Patrick Naulleau

Leveraging chemical contrast to spotlight the latent profile of novel resists (Conference Presentation)

2019 ◽  
Author(s):  
Isvar A. Cordova ◽  
Guillaume Freychet ◽  
Luke Long ◽  
Scott Dhuey ◽  
Cheng Wang ◽  
...  
Keyword(s):  
Latent Profile

EUV metrology tools diversified from common building blocks and experience (Conference Presentation)

2019 ◽  
Author(s):  
Rainer Lebert ◽  
Andreas Biermanns-Föth ◽  
Jennifer Arps ◽  
Thomas Missalla ◽  
Christoph Phiesel ◽  
...  
Keyword(s):  
Building Blocks

Large area EUV via yield analysis for single damascene process: voltage contrast, CD and defect metrology (Conference Presentation)

2019 ◽  
Author(s):  
Victor M. Blanco Carballo ◽  
Sara Paolillo ◽  
Marleen van der Veen ◽  
Stephane Lariviere ◽  
Gian Lorusso ◽  
...  
Keyword(s):  
Large Area ◽  
Yield Analysis ◽  
Damascene Process ◽  
Voltage Contrast

Through-pellicle inspection using EUV ptychography microscope (Conference Presentation)

2019 ◽  
Author(s):  
Young Woong Kim ◽  
Dong Gon Woo ◽  
Yong Ju Jang ◽  
Seong Ju Wi ◽  
Jinho Ahn ◽  
...  
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