Improvement on surface texturing of single crystalline silicon for solar cells by saw-damage etching using an acidic solution

2009 ◽  
Vol 93 (10) ◽  
pp. 1773-1778 ◽  
Author(s):  
Hayoung Park ◽  
Soonwoo Kwon ◽  
Joon Sung Lee ◽  
Hee Jin Lim ◽  
Sewang Yoon ◽  
...  
Keyword(s):  
Solar Cells ◽  
Acidic Solution ◽  
Crystalline Silicon ◽  
Surface Texturing ◽  
Single Crystalline Silicon ◽  
Single Crystalline

Surface-Texturing of Single-Crystalline Silicon Wafers

2011 ◽  
Vol 479 ◽  
pp. 124-131 ◽  
Author(s):  
Jian Yang Lin ◽  
Pai Yu Chang ◽  
Chih Kai Hu ◽  
Bin Hon Wu
Keyword(s):  
Solar Cells ◽  
Crystalline Silicon ◽  
Incident Light ◽  
Surface Texturing ◽  
Front Surface ◽  
Anisotropic Etching ◽  
Silicon Wafers ◽  
Surface Reflectance ◽  
Single Crystalline Silicon ◽  
Single Crystalline

In this work, alkaline-based anisotropic etchants, tetramethylammonium hydroxide (TMAH) and potassium hydroxide (KOH)/isopropyl alcohol (IPA) solutions, have been used for the surface texturing of the single-crystalline silicon wafers used for solar cells. The pyramid morphology produced by the surface texturing can reduce the surface reflection of the incident light and increase the light absorption so that the efficiency of the solar cells can be increased. The experimental data shows that the optimized surface texturing has been obtained with 5 wt. % TMAH anisotropic etching at 80 °C. The surface reflectance of the polished front surface can be reduced to 17 % and the surface reflectance of the unpolished backside surface can be reduced to 3 %, respectively. This result shows that the anisotropic etching can effectively reduce the surface reflectance. While for the surface texturing with KOH/IPA mixture, the front surface reflectance can only be reduced to 35 % and the backside surface reflectance can only be reduced to 5 %, respectively. Besides, debris of Si nano-crystals exists around the pyramid base area when texturing with the KOH/IPA mixture.

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