Characterization of nanocrystalline AlTiN coatings synthesized by a cathodic-arc deposition process

2007 ◽  
Vol 201 (15) ◽  
pp. 6699-6701 ◽  
Author(s):  
Yin-Yu Chang ◽  
Da-Yung Wang
Keyword(s):  
Deposition Process ◽  
Cathodic Arc Deposition ◽  
Cathodic Arc ◽  
Arc Deposition

Microstructure Characterization of Multilayered TiSiN/CrN Thin Films

2008 ◽  
Vol 8 (5) ◽  
pp. 2688-2692 ◽  
Author(s):  
Sheng-Min Yang ◽  
Yin-Yu Chang ◽  
Dong-Yih Lin ◽  
Da-Yung Wang ◽  
Weite Wu
Keyword(s):  
Lamellar Structure ◽  
Deposition Process ◽  
X Ray Diffraction ◽  
X Ray ◽  
Cathodic Arc Deposition ◽  
Cathode Current ◽  
Cathodic Arc ◽  
Crn Coatings ◽  
Arc Deposition

Monolayered TiSiN and multilayered TiSiN/CrN coatings were synthesized by a cathodic arc deposition process. The chromium and Ti/Si (80/20 at.%) alloy targets were adopted as the cathode materials, altering the ratio of cathode current (I[TiSi]/I[Cr]) to obtain various multilayer periodic thicknesses of multilayered TiSiN/CrN coatings. X-ray diffraction and TEM analyses showed that all the deposited monolayered TiSiN and multilayered TiSiN/CrN films possessed the B1-NaCl structure. In this study, it was shown that the multilayer periods (Λ) of the TiSiN/CrN deposited at I[TiSi]/I[Cr] cathode current ratios of 1.8, 1.0, and 0.55 were 8.3 nm, 6.2 nm, and 4.2 nm, respectively, with multilayer periodic thicknesses decreasing with smaller I[TiSi]/I[Cr] cathode current ratios. An amorphous phase was found at the boundaries of the TiN/CrN column grains. In addition, the multilayered TiSiN/CrN coatings displayed a lamellar structure that was well-defined and nonplanar between each TiN and CrN layer.

Synthesis and characterization of nano-composite Ti–Si–N hard coating by filtered cathodic arc deposition

2008 ◽  
Vol 203 (5-7) ◽  
pp. 619-623 ◽  
Author(s):  
Chi-Lung Chang ◽  
Jun-Han Chen ◽  
Pi-Chuen Tsai ◽  
Wei-Yu Ho ◽  
Da-Yung Wang
Keyword(s):  
Hard Coating ◽  
Synthesis And Characterization ◽  
Nano Composite ◽  
Cathodic Arc Deposition ◽  
Cathodic Arc ◽  
Arc Deposition

scholarly journals Mechanical Properties of Amorphous Hard Carbon Films Prepared by Cathodic ARC Deposition

1995 ◽  
Vol 383 ◽  
Author(s):  
Simone Anders ◽  
André Anders ◽  
Joel W. Ager ◽  
Zhi Wang ◽  
George M. Pharr ◽  
...  
Keyword(s):  
Bias Voltage ◽  
Deposition Process ◽  
Carbon Films ◽  
Carbon Ions ◽  
Hard Carbon ◽  
Cathodic Arc Deposition ◽  
Transmission Electron ◽  
As Stress ◽  
Cathodic Arc ◽  
Arc Deposition

ABSTRACTCathodic arc deposition combined with macroparticle filtering of the plasma is an efficient and versatile method for the deposition of amorphous hard carbon films of high quality. The film properties can be tailored over a broad range by varying the energy of the carbon ions incident upon the substrate and upon the growing film by applying a pulsed bias technique. By varying the bias voltage during the deposition process specific properties of the interface, bulk film and top surface layer can be obtained. We report on nanoindentation and transmission electron microscopy studies as well as stress measurements of cathodic-arc amorphous hard carbon films deposited with varied bias voltage. The investigations were performed on multilayers consisting of alternating hard and soft amorphous carbon.

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