scholarly journals Mechanical Properties of Amorphous Hard Carbon Films Prepared by Cathodic ARC Deposition

1995 ◽  
Vol 383 ◽  
Author(s):  
Simone Anders ◽  
André Anders ◽  
Joel W. Ager ◽  
Zhi Wang ◽  
George M. Pharr ◽  
...  
Keyword(s):  
Bias Voltage ◽  
Deposition Process ◽  
Carbon Films ◽  
Carbon Ions ◽  
Hard Carbon ◽  
Cathodic Arc Deposition ◽  
Transmission Electron ◽  
As Stress ◽  
Cathodic Arc ◽  
Arc Deposition

ABSTRACTCathodic arc deposition combined with macroparticle filtering of the plasma is an efficient and versatile method for the deposition of amorphous hard carbon films of high quality. The film properties can be tailored over a broad range by varying the energy of the carbon ions incident upon the substrate and upon the growing film by applying a pulsed bias technique. By varying the bias voltage during the deposition process specific properties of the interface, bulk film and top surface layer can be obtained. We report on nanoindentation and transmission electron microscopy studies as well as stress measurements of cathodic-arc amorphous hard carbon films deposited with varied bias voltage. The investigations were performed on multilayers consisting of alternating hard and soft amorphous carbon.

Structure of high hardness cathodic-arc deposited carbon

1995 ◽  
Vol 53 ◽  
pp. 206-207
Author(s):  
D. L. Callahan ◽  
S. D. McAdams ◽  
S. Anders ◽  
A. Anders ◽  
I.G. Brown ◽  
...  
Keyword(s):  
High Hardness ◽  
Carbon Films ◽  
Peak Hardness ◽  
Nanocrystalline Phase ◽  
Substrate Bias ◽  
Plan View ◽  
Cathodic Arc Deposition ◽  
Transmission Electron ◽  
Cathodic Arc ◽  
Arc Deposition

Carbon films exhibiting a peak hardness of 59 GPa have been produced using pulsebiased cathodic-arc deposition. This value is much greater than that expected of an amorphous "diamond-like" carbon (die) film and is well within the hardness range of chemically vapor-deposited diamond. Furthermore, this peak hardness is observed at an indentation depth of approximately 50 nm and not on the upper surface of the film. A structural analysis by transmission electron microscopy (TEM) has been conducted in order to explain these mechanical phenomena.Details of the sputtering apparatus are described elsewhere. Films for this study were deposited on silicon using a two-step process in which a thin layer, approximately 10 nm, was first deposited at a relatively high substrate bias (~2 kV) followed by growth of the majority of the film at a lower bias (~200 V). Plan-view examination of carbon films revealed both uniformly amorphous regions and extensive nanocrystalline phase regions.

scholarly journals Thermal stability of amorphous hard carbon films produced by cathodic arc deposition

1997 ◽  
Vol 71 (23) ◽  
pp. 3367-3369 ◽  
Author(s):  
Simone Anders ◽  
Javier Dı́az ◽  
Joel W. Ager ◽  
Roger Yu Lo ◽  
David B. Bogy
Keyword(s):  
Thermal Stability ◽  
Carbon Films ◽  
Hard Carbon ◽  
Cathodic Arc Deposition ◽  
Cathodic Arc ◽  
Arc Deposition ◽  
Thermal Stability Of

scholarly journals Hardness, elastic modulus, and structure of very hard carbon films produced by cathodic‐arc deposition with substrate pulse biasing

1996 ◽  
Vol 68 (6) ◽  
pp. 779-781 ◽  
Author(s):  
George M. Pharr ◽  
Daniel L. Callahan ◽  
Shaun D. McAdams ◽  
Ting Y. Tsui ◽  
Simone Anders ◽  
...  
Keyword(s):  
Elastic Modulus ◽  
Carbon Films ◽  
Hard Carbon ◽  
Cathodic Arc Deposition ◽  
Cathodic Arc ◽  
Arc Deposition

Structural Characteristics of Diamond-Like Carbon Films Synthesized by Different Methods

2017 ◽  
Vol 743 ◽  
pp. 112-117
Author(s):  
Alexander Zolkin ◽  
Anna Semerikova ◽  
Sergey Chepkasov ◽  
Maksim Khomyakov
Keyword(s):  
Amorphous Phase ◽  
Ion Beam ◽  
High Energy ◽  
Carbon Films ◽  
Ion Source ◽  
Ordered Structure ◽  
Deposition Technique ◽  
Cathodic Arc Deposition ◽  
Cathodic Arc ◽  
Arc Deposition

In the present study, the Raman spectra of diamond-like amorphous (a-C) and hydrogenated amorphous (a-C:H) carbon films on silicon obtained using the ion-beam methods and the pulse cathodic arc deposition technique were investigated with the aim of elucidating the relation between the hardness and structure of the films. The hardness of the samples used in the present study was 19 – 45 GPa. Hydrogenated carbon films were synthesized using END–Hall ion sources and a linear anode layer ion source (LIS) on single-crystal silicon substrates. The gas precursors were CH4 and C3H8, and the rate of the gas flow fed into the ion source was 4.4 to 10 sccm. The ion energies ranged from 150 to 600 eV. a-C films were deposited onto Si substrates using the pulse cathodic arc deposition technique. The films obtained by the pulse arc technique contained elements with an ordered structure. In the films synthesized using low- (150 eV) and high-energy (600 eV) ions beams, an amorphous phase was the major phase. The significant blurriness of the diffraction rings in the electron diffraction patterns due to a large film thickness (180 – 250 nm) did not allow distinctly observing the signals from the elements with an ordered structure against the background of an amorphous phase.

Microstructure Characterization of Multilayered TiSiN/CrN Thin Films

2008 ◽  
Vol 8 (5) ◽  
pp. 2688-2692 ◽  
Author(s):  
Sheng-Min Yang ◽  
Yin-Yu Chang ◽  
Dong-Yih Lin ◽  
Da-Yung Wang ◽  
Weite Wu
Keyword(s):  
Lamellar Structure ◽  
Deposition Process ◽  
X Ray Diffraction ◽  
X Ray ◽  
Cathodic Arc Deposition ◽  
Cathode Current ◽  
Cathodic Arc ◽  
Crn Coatings ◽  
Arc Deposition

Monolayered TiSiN and multilayered TiSiN/CrN coatings were synthesized by a cathodic arc deposition process. The chromium and Ti/Si (80/20 at.%) alloy targets were adopted as the cathode materials, altering the ratio of cathode current (I[TiSi]/I[Cr]) to obtain various multilayer periodic thicknesses of multilayered TiSiN/CrN coatings. X-ray diffraction and TEM analyses showed that all the deposited monolayered TiSiN and multilayered TiSiN/CrN films possessed the B1-NaCl structure. In this study, it was shown that the multilayer periods (Λ) of the TiSiN/CrN deposited at I[TiSi]/I[Cr] cathode current ratios of 1.8, 1.0, and 0.55 were 8.3 nm, 6.2 nm, and 4.2 nm, respectively, with multilayer periodic thicknesses decreasing with smaller I[TiSi]/I[Cr] cathode current ratios. An amorphous phase was found at the boundaries of the TiN/CrN column grains. In addition, the multilayered TiSiN/CrN coatings displayed a lamellar structure that was well-defined and nonplanar between each TiN and CrN layer.

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