Mechanical Properties of TiAlN/CrN Nanolayered Coatings Synthesized by a Cathodic-Arc Deposition Process

2006 ◽  
pp. 323-327 ◽  
Author(s):  
Yin Yu Chang ◽  
Da Yung Wang ◽  
Chi Yung Hung
Keyword(s):  
Mechanical Properties ◽  
Deposition Process ◽  
Cathodic Arc Deposition ◽  
Cathodic Arc ◽  
Arc Deposition

Structural and mechanical properties of Cr–Al–O–N thin films grown by cathodic arc deposition

2012 ◽  
Vol 60 (19) ◽  
pp. 6494-6507 ◽  
Author(s):  
A. Khatibi ◽  
J. Sjölen ◽  
G. Greczynski ◽  
J. Jensen ◽  
P. Eklund ◽  
...  
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Cathodic Arc Deposition ◽  
Cathodic Arc ◽  
Arc Deposition

Measurement of Mechanical Properties of Single and Multilayered Nitride thin Films Prepared by Cathodic Arc Deposition

2001 ◽  
Vol 697 ◽  
Author(s):  
A.K. Sikder ◽  
I. M. Irfan ◽  
Ashok Kumar ◽  
Robert Durvin ◽  
Mark McDonough ◽  
...  
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
X Ray Diffraction ◽  
Thin Coatings ◽  
Force Microscopy ◽  
Atomic Force ◽  
Cathodic Arc Deposition ◽  
Steel Substrates ◽  
Cathodic Arc ◽  
Arc Deposition

Mechanical properties of thin films differ significantly from those of bulk materials due to the effects of interfaces, microstructure and thick underlying substrates. In this study we will present the results of nanoindentation tests to evaluate mechanical properties of nitride (TiN, ZrN, CrN, TiCN and TiAlN) thin films. Films were coated on steel substrates using cathodic arc deposition technique. Surface morphology and roughness of the samples are investigated using atomic force microscopy (AFM). Films were also characterized by x-ray diffraction (XRD) technique. Nanoindentation technique along with AFM and XRD methods are very useful for characterizing hard thin coatings.

Microstructure Characterization of Multilayered TiSiN/CrN Thin Films

2008 ◽  
Vol 8 (5) ◽  
pp. 2688-2692 ◽  
Author(s):  
Sheng-Min Yang ◽  
Yin-Yu Chang ◽  
Dong-Yih Lin ◽  
Da-Yung Wang ◽  
Weite Wu
Keyword(s):  
Lamellar Structure ◽  
Deposition Process ◽  
X Ray Diffraction ◽  
X Ray ◽  
Cathodic Arc Deposition ◽  
Cathode Current ◽  
Cathodic Arc ◽  
Crn Coatings ◽  
Arc Deposition

Monolayered TiSiN and multilayered TiSiN/CrN coatings were synthesized by a cathodic arc deposition process. The chromium and Ti/Si (80/20 at.%) alloy targets were adopted as the cathode materials, altering the ratio of cathode current (I[TiSi]/I[Cr]) to obtain various multilayer periodic thicknesses of multilayered TiSiN/CrN coatings. X-ray diffraction and TEM analyses showed that all the deposited monolayered TiSiN and multilayered TiSiN/CrN films possessed the B1-NaCl structure. In this study, it was shown that the multilayer periods (Λ) of the TiSiN/CrN deposited at I[TiSi]/I[Cr] cathode current ratios of 1.8, 1.0, and 0.55 were 8.3 nm, 6.2 nm, and 4.2 nm, respectively, with multilayer periodic thicknesses decreasing with smaller I[TiSi]/I[Cr] cathode current ratios. An amorphous phase was found at the boundaries of the TiN/CrN column grains. In addition, the multilayered TiSiN/CrN coatings displayed a lamellar structure that was well-defined and nonplanar between each TiN and CrN layer.

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