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Experimental observations of the thermal stability of high-k gate dielectric materials on silicon
Journal of Non-Crystalline Solids
◽
10.1016/s0022-3093(02)00964-x
◽
2002
◽
Vol 303
(1)
◽
pp. 54-63
◽
Cited By ~ 54
Author(s):
P.S. Lysaght
◽
P.J. Chen
◽
R. Bergmann
◽
T. Messina
◽
R.W. Murto
◽
...
Keyword(s):
Thermal Stability
◽
Gate Dielectric
◽
Dielectric Materials
◽
High K
◽
Thermal Stability Of
◽
High K Gate Dielectric
Download Full-text
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Improved thermal stability of Al2O3/HfO2/Al2O3 high-k gate dielectric stack on GaAs
Applied Physics Letters
◽
10.1063/1.3377915
◽
2010
◽
Vol 96
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◽
pp. 142112
◽
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◽
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◽
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◽
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◽
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◽
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Thermal Stability
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◽
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Thermal Stability and Electrical Properties of High-k Gate Dielectric Materials
2006 International Workshop on Junction Technology
◽
10.1109/iwjt.2006.1669482
◽
2006
◽
Author(s):
A.P. Huang
◽
P.K. Chu
◽
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Keyword(s):
Thermal Stability
◽
Electrical Properties
◽
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◽
Dielectric Materials
◽
High K
◽
High K Gate Dielectric
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Thermal Stability and Electrical Properties of High-k Gate Dielectric Materials
2006 International Workshop on Junction Technology
◽
10.1109/iwjt.2006.220895
◽
2006
◽
Author(s):
A.P. Huang
◽
P.K. Chu
Keyword(s):
Thermal Stability
◽
Electrical Properties
◽
Gate Dielectric
◽
Dielectric Materials
◽
High K
◽
High K Gate Dielectric
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Thermal stability and electrical properties of titanium-aluminum oxide ultrathin films as high-k gate dielectric materials
Journal of Applied Physics
◽
10.1063/1.2432401
◽
2007
◽
Vol 101
(3)
◽
pp. 034102
◽
Cited By ~ 23
Author(s):
L. Shi
◽
Y. D. Xia
◽
B. Xu
◽
J. Yin
◽
Z. G. Liu
Keyword(s):
Thermal Stability
◽
Electrical Properties
◽
Aluminum Oxide
◽
Ultrathin Films
◽
Gate Dielectric
◽
Dielectric Materials
◽
High K
◽
Titanium Aluminum
◽
High K Gate Dielectric
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Development of High-K Gate Dielectric Materials
Journal of Inorganic Materials
◽
10.3724/sp.j.1077.2008.00865
◽
2008
◽
Vol 23
(5)
◽
pp. 865-871
◽
Cited By ~ 2
Author(s):
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Keyword(s):
Gate Dielectric
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Dielectric Materials
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High K Gate Dielectric
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Thermal stability and electrical properties of Zr silicate films for high-k gate-dielectric applications, as prepared by pulsed laser deposition
Applied Physics A
◽
10.1007/s00339-003-2187-4
◽
2005
◽
Vol 80
(2)
◽
pp. 321-324
◽
Cited By ~ 7
Author(s):
J. Zhu
◽
Z.G. Liu
◽
M. Zhu
◽
G.L. Yuan
◽
J.M. Liu
Keyword(s):
Thermal Stability
◽
Electrical Properties
◽
Pulsed Laser Deposition
◽
Gate Dielectric
◽
Pulsed Laser
◽
Laser Deposition
◽
High K
◽
High K Gate Dielectric
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First-principles modeling of high-k gate dielectric materials
Computational Materials Science
◽
10.1016/s0927-0256(01)00209-9
◽
2002
◽
Vol 23
(1-4)
◽
pp. 43-47
◽
Cited By ~ 33
Author(s):
Kyeongjae Cho
Keyword(s):
First Principles
◽
Gate Dielectric
◽
Dielectric Materials
◽
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◽
High K Gate Dielectric
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Lanthanide-Based High-k Gate Dielectric Materials
High Permittivity Gate Dielectric Materials - Springer Series in Advanced Microelectronics
◽
10.1007/978-3-642-36535-5_9
◽
2013
◽
pp. 343-369
◽
Cited By ~ 1
Author(s):
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CHC degradation of strained devices based on SiON and high-k gate dielectric materials
Microelectronic Engineering
◽
10.1016/j.mee.2011.03.094
◽
2011
◽
Vol 88
(7)
◽
pp. 1408-1411
◽
Cited By ~ 2
Author(s):
E. Amat
◽
R. Rodríguez
◽
M.B. González
◽
J. Martín-Martínez
◽
M. Nafría
◽
...
Keyword(s):
Gate Dielectric
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Dielectric Materials
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High K Gate Dielectric
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Improved IGZO-TFT structure Using High-k Gate Dielectric Materials
2019 International Conference on Wireless Technologies, Embedded and Intelligent Systems (WITS)
◽
10.1109/wits.2019.8723852
◽
2019
◽
Cited By ~ 2
Author(s):
Abdelhafid Marroun
◽
Naima Amar Touhami
◽
Taj-Eddin El Hamadi
Keyword(s):
Gate Dielectric
◽
Dielectric Materials
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High K
◽
Igzo Tft
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High K Gate Dielectric
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