Thermal stability and electrical properties of Zr silicate films for high-k gate-dielectric applications, as prepared by pulsed laser deposition

2005 ◽  
Vol 80 (2) ◽  
pp. 321-324 ◽  
Author(s):  
J. Zhu ◽  
Z.G. Liu ◽  
M. Zhu ◽  
G.L. Yuan ◽  
J.M. Liu
Keyword(s):  
Thermal Stability ◽  
Electrical Properties ◽  
Pulsed Laser Deposition ◽  
Gate Dielectric ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
High K ◽  
High K Gate Dielectric

Improved thermal stability, interface, and electrical properties of HfO2 films prepared by pulsed laser deposition using in situ ionized nitrogen

2009 ◽  
Vol 95 (3) ◽  
pp. 032905 ◽  
Author(s):  
Yi Wang ◽  
Hao Wang ◽  
Jun Zhang ◽  
Hanbin Wang ◽  
Cong Ye ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Electrical Properties ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition

Structural, optical and electrical properties of high-k ZrO2 dielectrics on Si prepared by plasma assisted pulsed laser deposition

2012 ◽  
Vol 520 (20) ◽  
pp. 6361-6367 ◽  
Author(s):  
W. Zhang ◽  
Y. Cui ◽  
Z.G. Hu ◽  
W.L. Yu ◽  
J. Sun ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Optical And Electrical Properties ◽  
High K

Structure and electrical properties of HfO2 high-k films prepared by pulsed laser deposition on Si (100)

2008 ◽  
Vol 93 (3) ◽  
pp. 681-684 ◽  
Author(s):  
Hao Wang ◽  
Y. Wang ◽  
J. Feng ◽  
C. Ye ◽  
B. Y. Wang ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
High K

Improved thermal stability and electrical properties of atomic layer deposited HfO2/AlN high-k gate dielectric stacks on GaAs

2015 ◽  
Vol 33 (1) ◽  
pp. 01A136 ◽  
Author(s):  
Yan-Qiang Cao ◽  
Xin Li ◽  
Lin Zhu ◽  
Zheng-Yi Cao ◽  
Di Wu ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Electrical Properties ◽  
Gate Dielectric ◽  
Atomic Layer ◽  
High K ◽  
High K Gate Dielectric
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