Improved thermal stability of Al2O3/HfO2/Al2O3 high-k gate dielectric stack on GaAs

Applied Physics Letters ◽

10.1063/1.3377915 ◽

2010 ◽

Vol 96 (14) ◽

pp. 142112 ◽

Author(s):

Dong Chan Suh ◽

Young Dae Cho ◽

Sun Wook Kim ◽

Dae-Hong Ko ◽

Yongshik Lee ◽

...

Keyword(s):

Thermal Stability ◽

Gate Dielectric ◽

High K ◽

Thermal Stability Of ◽

High K Gate Dielectric

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Experimental observations of the thermal stability of high-k gate dielectric materials on silicon

Journal of Non-Crystalline Solids ◽

10.1016/s0022-3093(02)00964-x ◽

2002 ◽

Vol 303 (1) ◽

pp. 54-63 ◽

Author(s):

P.S. Lysaght ◽

P.J. Chen ◽

R. Bergmann ◽

T. Messina ◽

R.W. Murto ◽

...

Keyword(s):

Thermal Stability ◽

Gate Dielectric ◽

Dielectric Materials ◽

High K ◽

Thermal Stability Of ◽

High K Gate Dielectric

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Thermal stability and electrical properties of Zr silicate films for high-k gate-dielectric applications, as prepared by pulsed laser deposition

Applied Physics A ◽

10.1007/s00339-003-2187-4 ◽

2005 ◽

Vol 80 (2) ◽

pp. 321-324 ◽

Author(s):

J. Zhu ◽

Z.G. Liu ◽

M. Zhu ◽

G.L. Yuan ◽

J.M. Liu

Keyword(s):

Thermal Stability ◽

Electrical Properties ◽

Pulsed Laser Deposition ◽

Gate Dielectric ◽

Pulsed Laser ◽

Laser Deposition ◽

High K ◽

High K Gate Dielectric

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Thermal Stability and Electrical Properties of High-k Gate Dielectric Materials

2006 International Workshop on Junction Technology ◽

10.1109/iwjt.2006.1669482 ◽

2006 ◽

Author(s):

A.P. Huang ◽

P.K. Chu ◽

P.K. Chu

Keyword(s):

Thermal Stability ◽

Electrical Properties ◽

Gate Dielectric ◽

Dielectric Materials ◽

High K ◽

High K Gate Dielectric

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Thermal Stability and Electrical Properties of High-k Gate Dielectric Materials

2006 International Workshop on Junction Technology ◽

10.1109/iwjt.2006.220895 ◽

2006 ◽

Author(s):

A.P. Huang ◽

P.K. Chu

Keyword(s):

Thermal Stability ◽

Electrical Properties ◽

Gate Dielectric ◽

Dielectric Materials ◽

High K ◽

High K Gate Dielectric

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Improved thermal stability and electrical properties of atomic layer deposited HfO2/AlN high-k gate dielectric stacks on GaAs

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.4903367 ◽

2015 ◽

Vol 33 (1) ◽

pp. 01A136 ◽

Author(s):

Yan-Qiang Cao ◽

Xin Li ◽

Lin Zhu ◽

Zheng-Yi Cao ◽

Di Wu ◽

...

Keyword(s):

Thermal Stability ◽

Electrical Properties ◽

Gate Dielectric ◽

Atomic Layer ◽

High K ◽

High K Gate Dielectric

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Thermal stability and electrical properties of pulsed laser deposited Hf–aluminate thin films for high-k gate dielectric applications

Journal of Physics D Applied Physics ◽

10.1088/0022-3727/38/3/014 ◽

2005 ◽

Vol 38 (3) ◽

pp. 446-450 ◽

Author(s):

J Zhu ◽

Z G Liu ◽

Y R Li

Keyword(s):

Thermal Stability ◽

Electrical Properties ◽

Gate Dielectric ◽

Pulsed Laser ◽

High K ◽

High K Gate Dielectric

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Thermal stability and electrical properties of titanium-aluminum oxide ultrathin films as high-k gate dielectric materials

Journal of Applied Physics ◽

10.1063/1.2432401 ◽

2007 ◽

Vol 101 (3) ◽

pp. 034102 ◽

Author(s):

L. Shi ◽

Y. D. Xia ◽

B. Xu ◽

J. Yin ◽

Z. G. Liu

Keyword(s):

Thermal Stability ◽

Electrical Properties ◽

Aluminum Oxide ◽

Ultrathin Films ◽

Gate Dielectric ◽

Dielectric Materials ◽

High K ◽

Titanium Aluminum ◽

High K Gate Dielectric

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Thermal stability of high-k Er-silicate gate dielectric formed by interfacial reaction between Er and SiO2 films

Materials Science in Semiconductor Processing ◽

10.1016/j.mssp.2009.06.001 ◽

2008 ◽

Vol 11 (4) ◽

pp. 122-125 ◽

Author(s):

Sung-Yong Chang ◽

Myeong-Il Jeong ◽

S.V. Jagadeesh Chandra ◽

Yong-Boo Lee ◽

Hyo-Bong Hong ◽

...

Keyword(s):

Thermal Stability ◽

Interfacial Reaction ◽

Gate Dielectric ◽

High K ◽

Thermal Stability Of

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The impact of high-k gate dielectric on Junctionless Vertical Double Gate MOSFET

International Journal of Computer Sciences and Engineering ◽

10.26438/ijcse/v6i6.14751478 ◽

2018 ◽

Vol 6 (6) ◽

pp. 1475-1478

Author(s):

Jagdeep Rahul

Keyword(s):

Gate Dielectric ◽

Double Gate ◽

High K ◽

Double Gate Mosfet ◽

High K Gate Dielectric

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Development of High-K Gate Dielectric Materials

Journal of Inorganic Materials ◽

10.3724/sp.j.1077.2008.00865 ◽

2008 ◽

Vol 23 (5) ◽

pp. 865-871 ◽

Author(s):

De-Qi WU

Keyword(s):

Gate Dielectric ◽

Dielectric Materials ◽

High K ◽

High K Gate Dielectric

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