Application of the ZBA-10 electron-beam exposure system in the production of precision photomasks with pattern element dimensions in the submicron range

1981 ◽  
Vol 12 (1) ◽  
pp. 41
Keyword(s):  
Electron Beam ◽  
Exposure System ◽  
Pattern Element

Automatic registration in an electron-beam exposure system

1976 ◽  
Author(s):  
D.E. Davis ◽  
R.D. Moore ◽  
M.C. Williams ◽  
O.C. Woodard
Keyword(s):  
Electron Beam ◽  
Automatic Registration ◽  
Exposure System

An Electron Beam Exposure System (VL-RI)

1978 ◽  
Author(s):  
M. Sumi ◽  
M. Ninomiya ◽  
F. Chiba ◽  
M. Nakasuji ◽  
S. Sano ◽  
...  
Keyword(s):  
Electron Beam ◽  
Exposure System

A multiple-electron-beam exposure system for high-throughput, direct-write submicrometer lithography

1981 ◽  
Vol 28 (11) ◽  
pp. 1422-1428 ◽  
Author(s):  
I. Brodie ◽  
E.R. Westerberg ◽  
D.R. Cone ◽  
J.J. Muray ◽  
N. Williams ◽  
...  
Keyword(s):  
Electron Beam ◽  
High Throughput ◽  
Direct Write ◽  
Exposure System

Applications of the electron beam exposure system (EBES)

1974 ◽  
Author(s):  
R.F.W. Pease ◽  
J.P. Ballantyne ◽  
R.C. Henderson ◽  
A.M. Voshchenkov ◽  
L.D. Yau
Keyword(s):  
Electron Beam ◽  
Exposure System
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