Phase field model of surface electromigration in single crystal metal thin films

1999 ◽  
Vol 126 (3-4) ◽  
pp. 201-213 ◽  
Author(s):  
Mohan Mahadevan ◽  
R.Mark Bradley
2019 ◽  
Vol 21 (29) ◽  
pp. 16207-16212 ◽  
Author(s):  
Ziming Cai ◽  
Chaoqiong Zhu ◽  
Xiaohui Wang ◽  
Longtu Li

The coupled evolution of domain structure and dielectric breakdown is simulated via a phase-field model.


2013 ◽  
Vol 68 ◽  
pp. 23-26 ◽  
Author(s):  
D. Wang ◽  
Z.K. Jin ◽  
Y. Xing ◽  
H. Gao ◽  
X.K. Wang

2007 ◽  
Vol 90 (5) ◽  
pp. 052909 ◽  
Author(s):  
J. X. Zhang ◽  
Y. L. Li ◽  
D. G. Schlom ◽  
L. Q. Chen ◽  
F. Zavaliche ◽  
...  

2000 ◽  
Vol 652 ◽  
Author(s):  
Y. L. Li ◽  
S. Y. Hu ◽  
Z. K. Liu ◽  
L. Q. Chen

ABSTRACTA phase-field model for predicting the domain structure evolution in constrained ferroelectric thin films is developed. It employs an analytical elastic solution derived for a constrained film with arbitrary eigenstrain distributions. In particular, the model is applied to the domain structure evolution during a cubic→tetragonal proper ferro- electric phase transition. The effect of substrate constraint on the volume fractions of domain variants, domain-wall orientations, and domain shapes is studied. It is shown that the predicted results agree very well with existing experimental observations in ferroelectric thin films.


2006 ◽  
Vol 14 (3) ◽  
pp. 433-443 ◽  
Author(s):  
Mathieu Bouville ◽  
Shenyang Hu ◽  
Long-Qing Chen ◽  
Dongzhi Chi ◽  
David J Srolovitz

2001 ◽  
Vol 78 (24) ◽  
pp. 3878-3880 ◽  
Author(s):  
Y. L. Li ◽  
S. Y. Hu ◽  
Z. K. Liu ◽  
L. Q. Chen

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