A method of locating dried residue on a semiconductor wafer in vapor phase decomposition-total-reflection X-ray fluorescence spectrometry by monitoring scattered X-rays

2001 ◽  
Vol 56 (11) ◽  
pp. 2293-2300 ◽  
Author(s):  
Yoshihiro Mori ◽  
Kenichi Uemura ◽  
Motoyuki Yamagami ◽  
Takashi Yamada
1999 ◽  
Vol 48 (11) ◽  
pp. 1005-1011 ◽  
Author(s):  
Motoyuki YAMAGAMI ◽  
Masahiro NONOGUCHI ◽  
Takashi YAMADA ◽  
Takashi SHOJI ◽  
Tadashi UTAKA ◽  
...  

1983 ◽  
Vol 27 ◽  
pp. 547-556 ◽  
Author(s):  
T. Arai ◽  
S. Ohara

Spectrographic analysis for carbon and boron using fluorescent x-rays has been studied over the past few years; principles and applications for using those ultra-soft x-rays were described, based on the combination of total reflection and filtering rather than on the wavelength dispersive method of Bragg reflection (1, 2). However, oxygen and nitrogen, with x-ray wavelengths of 23.7lÅ and 31.60Å, respectively, cannot be detected as easily because of their high absorption by the detector window materials such as polypropylene, polyester or formvar films.


1999 ◽  
Vol 54 (10) ◽  
pp. 1409-1426 ◽  
Author(s):  
M Funahashi ◽  
M Matsuo ◽  
N Kawada ◽  
M Yamagami ◽  
R Wilson

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