Solid State Phenomena - Ultra Clean Processing of Semiconductor Surfaces VIII
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Development of a New TaN Etchant for Metal Gate

2007 ◽  
pp. 75-78
Author(s):  
Mong Sup Lee ◽  
Sang Yong Kim ◽  
Ji Hoon Cha ◽  
Jeong Nam Han ◽  
Im Soo Park ◽  
...  
Keyword(s):  
Metal Gate

Surface Preparation Challenge on Nitrided Gate Oxides

2007 ◽  
pp. 71-74
Author(s):  
Philippe Garnier ◽  
David Barge ◽  
Jerome Bienacel ◽  
Brice Tavel ◽  
Nicolas Cabuil ◽  
...  
Keyword(s):  
Surface Preparation ◽  
Gate Oxides

Evaluation of the Plasmaless Gaseous Etching Process

2007 ◽  
pp. 7-10
Author(s):  
Yoshiya Hagimoto ◽  
Hajime Ugajin ◽  
Daisuke Miyakoshi ◽  
Hayato Iwamoto ◽  
Yusuke Muraki ◽  
...  
Keyword(s):  
Etching Process

Effect of SC-1 Treatment in Thermal Wall Oxide on Nanoscale STI Gap-Filling by O3/TEOS CVD

2007 ◽  
pp. 57-60
Author(s):  
Seung Cheol Lee ◽  
Choon Kun Ryu ◽  
Sang Wook Park ◽  
Gyu An Jin ◽  
Sang Deok Kim ◽  
...  
Keyword(s):  
Gap Filling

Impact of Plasma and Diluted HF on a CoWP Material

2007 ◽  
pp. 321-324
Author(s):  
Diane Rébiscoul ◽  
Lucile Broussous ◽  
N. Lopez ◽  
A. Roman ◽  
R. Kachtouli ◽  
...  

Effect of Ozone Supply Methods on PRE in Alkaline Ozone Solutions

2007 ◽  
pp. 237-240
Author(s):  
Seung Ho Lee ◽  
Tae Gon Kim ◽  
Tae Young Kwon ◽  
Jin Goo Park ◽  
So Ik Bae ◽  
...  
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