Comparison of multicrystalline silicon surfaces after wet chemical etching and hydrogen plasma treatment: application to heterojunction solar cells

2002 ◽  
Vol 74 (1-4) ◽  
pp. 195-201 ◽  
Author(s):  
Alexander Ulyashin ◽  
Maximilian Scherff ◽  
Reza Hussein ◽  
Meizhen Gao ◽  
Reinhart Job ◽  
...  
2011 ◽  
Vol 34 (7) ◽  
pp. 1689-1692
Author(s):  
A. Mefoued ◽  
M. Fathi ◽  
J. Bhatt ◽  
A. Messaoud ◽  
B. Palahouane ◽  
...  

1991 ◽  
Vol 219 ◽  
Author(s):  
Y. S. Tsuo ◽  
Y. Xu ◽  
D. W. Baker ◽  
S.K Deb

ABSTRACTWe have studied wet-chemical and dry etching properties of doped and undoped hydrogenated amorphous silicon (a-Si:H) films with bonded hydrogen content varying from 0 to 20 at.%. Etching processes studied include (1) wet-chemical etching using solutions of KOH, isopropyl alcohol (IPA), and H2O, (2) hydrogen plasma etching, and (3) XeF2 vapor etching.


2012 ◽  
Vol 2012 ◽  
pp. 1-8 ◽  
Author(s):  
Chien-Wei Liu ◽  
Chin-Lung Cheng ◽  
Bau-Tong Dai ◽  
Chi-Han Yang ◽  
Jun-Yuan Wang

Nanostructured solar cells with coaxial p-n junction structures have strong potential to enhance the performances of the silicon-based solar cells. This study demonstrates a radial junction silicon nanowire (RJSNW) solar cell that was fabricated simply and at low cost using wet chemical etching. Experimental results reveal that the reflectance of the silicon nanowires (SNWs) declines as their length increases. The excellent light trapping was mainly associated with high aspect ratio of the SNW arrays. A conversion efficiency of ∼7.1% and an external quantum efficiency of ∼64.6% at 700 nm were demonstrated. Control of etching time and diffusion conditions holds great promise for the development of future RJSNW solar cells. Improving the electrode/RJSNW contact will promote the collection of carries in coaxial core-shell SNW array solar cells.


2018 ◽  
Vol 8 (6) ◽  
pp. 1539-1545 ◽  
Author(s):  
Menglei Xu ◽  
Chong Wang ◽  
Twan Bearda ◽  
Eddy Simoen ◽  
Hariharsudan Sivaramakrishnan Radhakrishnan ◽  
...  

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