scholarly journals Morphology-Graded Silicon Nanowire Arrays via Chemical Etching: Engineering Optical Properties at the Nanoscale and Macroscale

2020 ◽  
Vol 12 (11) ◽  
pp. 13140-13147 ◽  
Author(s):  
Fedja J. Wendisch ◽  
Mehri Abazari ◽  
Hossein Mahdavi ◽  
Marcel Rey ◽  
Nicolas Vogel ◽  
...  
2014 ◽  
Vol 24 (1) ◽  
pp. 105-105 ◽  
Author(s):  
Junghoon Yeom ◽  
Daniel Ratchford ◽  
Christopher R. Field ◽  
Todd H. Brintlinger ◽  
Pehr E. Pehrsson

2012 ◽  
Vol 21 ◽  
pp. 109-115 ◽  
Author(s):  
S. Naama ◽  
T. Hadjersi ◽  
G. Nezzal ◽  
L. Guerbous

One-step metal-assisted electroless chemical etching of p-type silicon substrate in NH4HF2/AgNO3 solution was investigated. The effect of different etching parameters including etching time, temperature, AgNO3 concentration and NH4HF2 concentration were investigated. The etched layers formed were investigated by scanning electron microscopy (SEM) and Photoluminescence. It was found that the etched layer was formed by well-aligned silicon nanowires. It is noted that their density and length strongly depend on etching parameters. Room temperature photoluminescence (PL) from etched layer was observed. It was observed that PL peak intensity increases significantly with AgNO3 concentration.


2017 ◽  
pp. 3-42 ◽  
Author(s):  
Anna S. Kalyuzhnaya ◽  
Aleksandra I. Efimova ◽  
Leonid A. Golovan ◽  
Kirill A. Gonchar ◽  
Victor Y. Timoshenko

2016 ◽  
Vol 111 ◽  
pp. 394-404 ◽  
Author(s):  
Chohdi Amri ◽  
Rachid Ouertani ◽  
Abderrahmean Hamdi ◽  
Radhouane Chtourou ◽  
Hatem Ezzaouia

2013 ◽  
Vol 24 (1) ◽  
pp. 106-116 ◽  
Author(s):  
Junghoon Yeom ◽  
Daniel Ratchford ◽  
Christopher R. Field ◽  
Todd H. Brintlinger ◽  
Pehr E. Pehrsson

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