Thermal Electron Attachment Studies by the Pulse-Sampling Technique

1968 ◽  
pp. 75-100 ◽  
Author(s):  
W. E. WENTWORTH ◽  
JOE C. STEELHAMMER
Keyword(s):  
Electron Attachment ◽  
Sampling Technique ◽  
Thermal Electron

scholarly journals Thermal Electron Attachment to SF6 and CFCl3

1983 ◽  
Vol 36 (1) ◽  
pp. 15 ◽  
Author(s):  
RW Crompton ◽  
GN Haddad
Keyword(s):  
Electron Density ◽  
Electron Attachment ◽  
Sampling Technique ◽  
Gas Mixtures ◽  
Single Source ◽  
Attachment Rate ◽  
Thermal Electron ◽  
Source Of Error

Measurements of the attachment rate for thermal electrons to SF6 and CFCI3 have been made using the Cavalieri electron-density sampling technique. The largest single source of error was shown to be uncertainty in the composition of the gas mixtures used in the experiments which contained < 10 ppm of the attaching gases. By paying special attention to this problem, the overall uncertainty in the attachment rates was reduced to less than � 3 %.

Thermal electron attachment to sulfur tetrafluoride

1982 ◽  
Vol 86 (8) ◽  
pp. 1240-1242 ◽  
Author(s):  
Lucia M. Babcock ◽  
Gerald E. Streit
Keyword(s):  
Electron Attachment ◽  
Thermal Electron ◽  
Sulfur Tetrafluoride

Thermal electron attachment to CHF2CL in mixtures with CO2 and N2

1996 ◽  
Vol 48 (1) ◽  
pp. 65-68 ◽  
Author(s):  
I. Szamrej ◽  
J. Jówko ◽  
M. Foryś
Keyword(s):  
Electron Attachment ◽  
Thermal Electron

A new instrument for thermal electron attachment at high temperature: NF3 and CH3Cl attachment rate constants up to 1100 K

2009 ◽  
Vol 80 (3) ◽  
pp. 034104 ◽  
Author(s):  
Thomas M. Miller ◽  
Jeffrey F. Friedman ◽  
John S. Williamson ◽  
Linda C. Schaffer ◽  
A. A. Viggiano
Keyword(s):  
High Temperature ◽  
Rate Constants ◽  
Electron Attachment ◽  
Attachment Rate ◽  
Thermal Electron ◽  
New Instrument
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