scholarly journals Real-time particle monitoring of pesticide drift from an axial fan airblast orchard sprayer

2018 ◽  
Vol 29 (3) ◽  
pp. 397-405 ◽  
Author(s):  
Magali N. Blanco ◽  
Richard A. Fenske ◽  
Edward J. Kasner ◽  
Michael G. Yost ◽  
Edmund Seto ◽  
...  
2000 ◽  
Vol 43 (1) ◽  
pp. 21-23
Author(s):  
Jon Carlberg ◽  
Don Hess

Etching is the process where a layer is removed from a wafer surface through openings in a photoresist pattern. To monitor this process, a surface scan was employed. An in-situ particle monitor (ISPM) was installed on a plasma etch tool. The ISPM was incorporated so engineers and technicians could gain real-time information and notification of what is happening inside this tool during processing. Since ISPMs are real-time, they can catch problems as they are occurring. The ISPM detected two major problems on the plasma etch tool within a 3-wk period. The wafer scan data were monitored during this same time frame.


2006 ◽  
Vol 16 (1) ◽  
pp. 9-14 ◽  
Author(s):  
Keivan Torabi ◽  
Saed Sayad ◽  
Stephen Thomas Balke

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