Fabrication of reduced graphene oxide/TiO2 nanorod/reduced graphene oxide hybrid nanostructures as electrode materials for supercapacitor applications

CrystEngComm ◽  
2013 ◽  
Vol 15 (47) ◽  
pp. 10222 ◽  
Author(s):  
Ananthakumar Ramadoss ◽  
Gui-Shik Kim ◽  
Sang Jae Kim
2017 ◽  
Vol 41 (18) ◽  
pp. 10467-10475 ◽  
Author(s):  
Nazish Parveen ◽  
Sajid Ali Ansari ◽  
S. G. Ansari ◽  
H. Fouad ◽  
Moo Hwan Cho

Anchoring of three dimensional (3D) metal oxides with a controlled morphology on a reduced graphene sheet (rGO) is a promising and challenging route towards the development of highly efficient electrode materials for supercapacitor applications.


2021 ◽  
Vol 717 (1) ◽  
pp. 60-71
Author(s):  
M. A. Hodlevska ◽  
R. I. Zapukhlyak ◽  
V. M. Boychuk ◽  
V. O. Kotsyubynsky ◽  
A. I. Kachmar ◽  
...  

2016 ◽  
Vol 40 (11) ◽  
pp. 9111-9124 ◽  
Author(s):  
A. Muthurasu ◽  
P. Dhandapani ◽  
V. Ganesh

A simple and facile method for the simultaneous preparation of graphene quantum dots (GQDs) having different emission colours, viz., yellow, green and blue, and reduced graphene oxide (RGO) utilized respectively for bio-imaging and supercapacitor applications is demonstrated.


RSC Advances ◽  
2014 ◽  
Vol 4 (43) ◽  
pp. 22551-22560 ◽  
Author(s):  
Rahul S. Diggikar ◽  
Dattatray J. Late ◽  
Bharat B. Kale

The unique morphologies of reduced graphene oxide (RGO) and RGO–PANI nanofibers (NF) composites have been demonstrated. The enhanced electrochemical performance was observed for honeycomb like RGO–PANI NFs composites.


2013 ◽  
Vol 27 (10) ◽  
pp. 6304-6310 ◽  
Author(s):  
Wei Li ◽  
Yongfeng Bu ◽  
Huile Jin ◽  
Jian Wang ◽  
Weiming Zhang ◽  
...  

2015 ◽  
Vol 17 (2) ◽  
pp. 776-780 ◽  
Author(s):  
Barun Kumar Barman ◽  
Karuna Kar Nanda

We demonstrate a Si-mediated environmentally friendly reduction of graphene oxide (GO) and the fabrication of hybrid electrode materials with multiwall carbon nanotubes and nanofibers. The reduction of GO is facilitated by the nascent hydrogen generated by the reaction between Si and KOH. The overall process consumes 10 to 15 μm of Si each time and the same Si substrate can be used multiple times.


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