High-density microwave plasma of SiH4/H2for high rate growth of highly crystallized microcrystalline silicon films

2006 ◽  
Vol 33 (3) ◽  
pp. 153-159 ◽  
Author(s):  
H. Jia ◽  
J. K. Saha ◽  
N. Ohse ◽  
H. Shirai
Keyword(s):  
Microwave Plasma ◽  
High Density ◽  
Silicon Films ◽  
High Rate ◽  
Microcrystalline Silicon

High rate growth highly crystallized microcrystalline silicon films using SiH4/H2 high-density microwave plasma

2007 ◽  
Vol 515 (9) ◽  
pp. 4098-4104 ◽  
Author(s):  
Jhantu K. Saha ◽  
Haijun Jia ◽  
Naoyuki Ohse ◽  
Hajime Shirai
Keyword(s):  
Microwave Plasma ◽  
High Density ◽  
Silicon Films ◽  
High Rate ◽  
Microcrystalline Silicon

High-rate synthesis of microcrystalline silicon films using high-density SiH4/H2 microwave plasma

2007 ◽  
Vol 515 (17) ◽  
pp. 6713-6720 ◽  
Author(s):  
Haijun Jia ◽  
Jhantu K. Saha ◽  
Naoyuki Ohse ◽  
Hajime Shirai
Keyword(s):  
Microwave Plasma ◽  
High Density ◽  
Silicon Films ◽  
High Rate ◽  
Microcrystalline Silicon

High-rate growth of microcrystalline silicon films using a high-density SiH4/H2 glow-discharge plasma

2004 ◽  
Vol 457 (1) ◽  
pp. 84-89 ◽  
Author(s):  
Chisato Niikura ◽  
Naho Itagaki ◽  
Michio Kondo ◽  
Yoshinobu Kawai ◽  
Akihisa Matsuda
Keyword(s):  
Glow Discharge ◽  
Discharge Plasma ◽  
High Density ◽  
Silicon Films ◽  
High Rate ◽  
Glow Discharge Plasma ◽  
Microcrystalline Silicon

Ultrafast deposition of microcrystalline silicon films using high-density microwave plasma

2009 ◽  
Vol 93 (6-7) ◽  
pp. 812-815 ◽  
Author(s):  
Haijun Jia ◽  
Hiroshi Kuraseko ◽  
Hiroyuki Fujiwara ◽  
Michio Kondo
Keyword(s):  
Microwave Plasma ◽  
High Density ◽  
Silicon Films ◽  
Microcrystalline Silicon

Low temperature formation of microcrystalline silicon films using high-density SiH4 microwave plasma

2001 ◽  
Vol 386 (2) ◽  
pp. 261-266 ◽  
Author(s):  
Yoshikazu Sakuma ◽  
Haiping Liu ◽  
Hajime Shirai ◽  
Yoshimizu Moriya ◽  
Hiroyuki Ueyama
Keyword(s):  
Low Temperature ◽  
Microwave Plasma ◽  
High Density ◽  
Silicon Films ◽  
Microcrystalline Silicon

The high-density microwave plasma for high rate deposition of microcrystalline silicon

1999 ◽  
Vol 345 (1) ◽  
pp. 7-11 ◽  
Author(s):  
Hajime Shirai ◽  
Yoshikazu Sakuma ◽  
Hiroyuki Ueyama
Keyword(s):  
Microwave Plasma ◽  
High Density ◽  
High Rate ◽  
Microcrystalline Silicon
Sign in / Sign up

Export Citation Format

Share Document