Effects of Chamber Wall Heating and Quartz Window on Fast Deposition of Microcrystalline Silicon Films by High-Density Microwave Plasma

2004 ◽  
Vol 43 (12) ◽  
pp. 7960-7965 ◽  
Author(s):  
Haijun Jia ◽  
Masanobu Nakajima ◽  
Aiko Nakao ◽  
Hajime Shirai
Keyword(s):  
Microwave Plasma ◽  
High Density ◽  
Silicon Films ◽  
Chamber Wall ◽  
Microcrystalline Silicon ◽  
Quartz Window ◽  
Wall Heating

High rate growth highly crystallized microcrystalline silicon films using SiH4/H2 high-density microwave plasma

2007 ◽  
Vol 515 (9) ◽  
pp. 4098-4104 ◽  
Author(s):  
Jhantu K. Saha ◽  
Haijun Jia ◽  
Naoyuki Ohse ◽  
Hajime Shirai
Keyword(s):  
Microwave Plasma ◽  
High Density ◽  
Silicon Films ◽  
High Rate ◽  
Microcrystalline Silicon

Ultrafast deposition of microcrystalline silicon films using high-density microwave plasma

2009 ◽  
Vol 93 (6-7) ◽  
pp. 812-815 ◽  
Author(s):  
Haijun Jia ◽  
Hiroshi Kuraseko ◽  
Hiroyuki Fujiwara ◽  
Michio Kondo
Keyword(s):  
Microwave Plasma ◽  
High Density ◽  
Silicon Films ◽  
Microcrystalline Silicon

Low temperature formation of microcrystalline silicon films using high-density SiH4 microwave plasma

2001 ◽  
Vol 386 (2) ◽  
pp. 261-266 ◽  
Author(s):  
Yoshikazu Sakuma ◽  
Haiping Liu ◽  
Hajime Shirai ◽  
Yoshimizu Moriya ◽  
Hiroyuki Ueyama
Keyword(s):  
Low Temperature ◽  
Microwave Plasma ◽  
High Density ◽  
Silicon Films ◽  
Microcrystalline Silicon

Novel High-Density Microwave Plasma Utilizing an Internal Spoke Antenna for Fast Deposition of Microcrystalline Silicon Films

2001 ◽  
Vol 40 (Part 2, No. 7A) ◽  
pp. L701-L704 ◽  
Author(s):  
Hajime Shirai ◽  
Koichi Yoshino ◽  
Go Ohkawara ◽  
Hiroyuki Ueyama
Keyword(s):  
Microwave Plasma ◽  
High Density ◽  
Silicon Films ◽  
Microcrystalline Silicon

High-rate synthesis of microcrystalline silicon films using high-density SiH4/H2 microwave plasma

2007 ◽  
Vol 515 (17) ◽  
pp. 6713-6720 ◽  
Author(s):  
Haijun Jia ◽  
Jhantu K. Saha ◽  
Naoyuki Ohse ◽  
Hajime Shirai
Keyword(s):  
Microwave Plasma ◽  
High Density ◽  
Silicon Films ◽  
High Rate ◽  
Microcrystalline Silicon

Synthesis of Microcrystalline Silicon Films Using High-Density Microwave Plasma Source from Dichlorosilane

2007 ◽  
Vol 46 (No. 28) ◽  
pp. L696-L698 ◽  
Author(s):  
Jhantu Kumar Saha ◽  
Naoyuki Ohse ◽  
Kazu Hamada ◽  
Koji Haruta ◽  
Tomohiro Kobayashi ◽  
...  
Keyword(s):  
Microwave Plasma ◽  
Plasma Source ◽  
High Density ◽  
Silicon Films ◽  
Microcrystalline Silicon
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