The high-density microwave plasma for high rate deposition of microcrystalline silicon

1999 ◽  
Vol 345 (1) ◽  
pp. 7-11 ◽  
Author(s):  
Hajime Shirai ◽  
Yoshikazu Sakuma ◽  
Hiroyuki Ueyama
Keyword(s):  
Microwave Plasma ◽  
High Density ◽  
High Rate ◽  
Microcrystalline Silicon

High rate growth highly crystallized microcrystalline silicon films using SiH4/H2 high-density microwave plasma

2007 ◽  
Vol 515 (9) ◽  
pp. 4098-4104 ◽  
Author(s):  
Jhantu K. Saha ◽  
Haijun Jia ◽  
Naoyuki Ohse ◽  
Hajime Shirai
Keyword(s):  
Microwave Plasma ◽  
High Density ◽  
Silicon Films ◽  
High Rate ◽  
Microcrystalline Silicon

High-rate synthesis of microcrystalline silicon films using high-density SiH4/H2 microwave plasma

2007 ◽  
Vol 515 (17) ◽  
pp. 6713-6720 ◽  
Author(s):  
Haijun Jia ◽  
Jhantu K. Saha ◽  
Naoyuki Ohse ◽  
Hajime Shirai
Keyword(s):  
Microwave Plasma ◽  
High Density ◽  
Silicon Films ◽  
High Rate ◽  
Microcrystalline Silicon

High-density microwave plasma-enhanced chemical vapor deposition of microcrystalline silicon from dichlorosilane

2008 ◽  
Vol 516 (19) ◽  
pp. 6585-6591 ◽  
Author(s):  
Naoyuki Ohse ◽  
Kazu Hamada ◽  
Jhantu Kumar Saha ◽  
Tomohiro Kobayashi ◽  
Yu-ichiro Takemura ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
High Density ◽  
Microcrystalline Silicon

High-rate growth of microcrystalline silicon films using a high-density SiH4/H2 glow-discharge plasma

2004 ◽  
Vol 457 (1) ◽  
pp. 84-89 ◽  
Author(s):  
Chisato Niikura ◽  
Naho Itagaki ◽  
Michio Kondo ◽  
Yoshinobu Kawai ◽  
Akihisa Matsuda
Keyword(s):  
Glow Discharge ◽  
Discharge Plasma ◽  
High Density ◽  
Silicon Films ◽  
High Rate ◽  
Glow Discharge Plasma ◽  
Microcrystalline Silicon
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