The effect of topographical local charging on the etching of deep-submicron structures in SiO2 as a function of aspect ratio

2001 ◽  
Vol 78 (7) ◽  
pp. 883-885 ◽  
Author(s):  
Jun Matsui ◽  
Nobuhiko Nakano ◽  
Zoran Lj. Petrović ◽  
Toshiaki Makabe
2002 ◽  
Author(s):  
Miyako Matsui ◽  
Mari Nozoe ◽  
Keiko Arauchi ◽  
Atsuko Takafuji ◽  
Hidetoshi Nishiyama ◽  
...  

2007 ◽  
Vol 84 (5-8) ◽  
pp. 1235-1239 ◽  
Author(s):  
Timo Mappes ◽  
Sven Achenbach ◽  
Juergen Mohr

1995 ◽  
Vol 5 (2) ◽  
pp. 1448-1451 ◽  
Author(s):  
A.J.M. van der Harg ◽  
E. van der Drift ◽  
P. Hadley

2008 ◽  
Vol 14 (9-11) ◽  
pp. 1683-1688 ◽  
Author(s):  
Elena Reznikova ◽  
Juergen Mohr ◽  
Martin Boerner ◽  
Vladimir Nazmov ◽  
Peter-Juergen Jakobs

2017 ◽  
Vol 53 (58) ◽  
pp. 8172-8175 ◽  
Author(s):  
Kwanghyun Kim ◽  
Sunyoung Yu ◽  
Sung-Wook Kim ◽  
Taegeon Kim ◽  
Sang-Min Kim ◽  
...  

This is the first report on the fabrication of defect-free submicron structures with more than 100 μm thickness and an aspect ratio over 100.


Sign in / Sign up

Export Citation Format

Share Document