The effect of topographical local charging on the etching of deep-submicron structures in SiO2 as a function of aspect ratio
2007 ◽
Vol 84
(5-8)
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pp. 1235-1239
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Keyword(s):
1995 ◽
Vol 5
(2)
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pp. 1448-1451
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2003 ◽
Vol 2
(3)
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pp. 227
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1997 ◽
Vol 37-38
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pp. 313-318
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2008 ◽
Vol 14
(9-11)
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pp. 1683-1688
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1992 ◽
Vol 10
(6)
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pp. 2708
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