High-k titanium silicate dielectric thin films grown by pulsed-laser deposition

2002 ◽  
Vol 80 (2) ◽  
pp. 294-296 ◽  
Author(s):  
D. K. Sarkar ◽  
E. Desbiens ◽  
M. A. El Khakani
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Titanium Silicate ◽  
Dielectric Thin Films ◽  
High K

Pulsed laser deposition and characterization of Hf-based high-k dielectric thin films

2007 ◽  
Vol 515 (16) ◽  
pp. 6548-6551 ◽  
Author(s):  
Mehmet Alper Sahiner ◽  
Joseph C. Woicik ◽  
Peng Gao ◽  
Patrick McKeown ◽  
Mark C. Croft ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Dielectric Thin Films ◽  
High K ◽  
High K Dielectric

Crystal-orientation controlled epitaxial CeO2 dielectric thin films on Si(100) substrates using pulsed laser deposition

2001 ◽  
Vol 56 (1-2) ◽  
pp. 191-194 ◽  
Author(s):  
Jinfeng Kang ◽  
Xiaoyan Liu ◽  
Guijun Lian ◽  
Zhaohui Zhang ◽  
Guangcheng Xiong ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Crystal Orientation ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Dielectric Thin Films

Gasdynamics and Chemistry in The Pulsed Laser Deposition of Oxide Dielectric Thin Films

1993 ◽  
Vol 334 ◽  
Author(s):  
John W. Hastie ◽  
David W. Bonnell ◽  
Albert J. Paul ◽  
Peter K. Schenck
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Recent Work ◽  
Pulsed Laser ◽  
Deposition Process ◽  
Laser Deposition ◽  
Research Groups ◽  
Dielectric Thin Films ◽  
Modeling Approaches

AbstractIn the context of “chemistry and its effects on film quality,” we and a number of other research groups have developed spectroscopic and modeling approaches to better define the pulsed laser deposition process. An overview of these approaches is given here, using the results of recent work performed in our laboratory on the oxide dielectric systems of BaTiO3 and PbZr0.53Ti0.47O3(PZT).

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