Novel Al1.997Hf0.003O3 High-k gate dielectric thin films grown by pulsed laser deposition using pre-synthesized target material

2021 ◽  
Author(s):  
Annie Maria Mahat ◽  
Mohd Sufri Mastuli ◽  
Nurhanna Badar ◽  
Norlida Kamarulzaman
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Gate Dielectric ◽  
Pulsed Laser ◽  
Target Material ◽  
Laser Deposition ◽  
Dielectric Thin Films ◽  
High K ◽  
High K Gate Dielectric

Pulsed laser deposition and characterization of Hf-based high-k dielectric thin films

2007 ◽  
Vol 515 (16) ◽  
pp. 6548-6551 ◽  
Author(s):  
Mehmet Alper Sahiner ◽  
Joseph C. Woicik ◽  
Peng Gao ◽  
Patrick McKeown ◽  
Mark C. Croft ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Dielectric Thin Films ◽  
High K ◽  
High K Dielectric

Crystal-orientation controlled epitaxial CeO2 dielectric thin films on Si(100) substrates using pulsed laser deposition

2001 ◽  
Vol 56 (1-2) ◽  
pp. 191-194 ◽  
Author(s):  
Jinfeng Kang ◽  
Xiaoyan Liu ◽  
Guijun Lian ◽  
Zhaohui Zhang ◽  
Guangcheng Xiong ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Crystal Orientation ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Dielectric Thin Films

Two-step interfacial reaction of HfO2 high-k gate dielectric thin films on Si

2004 ◽  
Vol 30 (7) ◽  
pp. 1267-1270 ◽  
Author(s):  
P.F. Lee ◽  
J.Y. Dai ◽  
H.L.W. Chan ◽  
C.L. Choy
Keyword(s):  
Thin Films ◽  
Interfacial Reaction ◽  
Gate Dielectric ◽  
Dielectric Thin Films ◽  
High K ◽  
High K Gate Dielectric
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