Electronic properties of ultrathin HfO2, Al2O3, and Hf–Al–O dielectric films on Si(100) studied by quantitative analysis of reflection electron energy loss spectra

2006 ◽  
Vol 100 (8) ◽  
pp. 083713 ◽  
Author(s):  
Hua Jin ◽  
Suhk Kun Oh ◽  
Hee Jae Kang ◽  
Sven Tougaard
1991 ◽  
Vol 162 (1) ◽  
pp. 23-42 ◽  
Author(s):  
C. W. J. Sorber ◽  
G. A. M. Ketelaars ◽  
E. S. Gelsema ◽  
J. F. Jongkind ◽  
W. C. Bruijn

Sign in / Sign up

Export Citation Format

Share Document