Electronic properties of ultrathin HfO2, Al2O3, and Hf–Al–O dielectric films on Si(100) studied by quantitative analysis of reflection electron energy loss spectra
1992 ◽
Vol 19
(1-12)
◽
pp. 269-273
◽
Keyword(s):
1991 ◽
Vol 162
(1)
◽
pp. 23-42
◽
1996 ◽
Vol 14
(6)
◽
pp. 3181-3188
◽
Keyword(s):
Keyword(s):
Keyword(s):