scholarly journals Ablation and transmission of thin solid targets irradiated by intense extreme ultraviolet laser radiation

APL Photonics ◽  
2016 ◽  
Vol 1 (6) ◽  
pp. 066101 ◽  
Author(s):  
V. Aslanyan ◽  
I. Kuznetsov ◽  
H. Bravo ◽  
M. R. Woolston ◽  
A. K. Rossall ◽  
...  
1993 ◽  
Vol 57 (6) ◽  
pp. 411-416 ◽  
Author(s):  
W. Ubachs ◽  
K. S. E. Eikema ◽  
W. Hogervorst

2015 ◽  
Author(s):  
Karel Kolacek ◽  
Jiri Schmidt ◽  
Jaroslav Straus ◽  
Oleksandr Frolov ◽  
Libor Juha ◽  
...  

2005 ◽  
Vol 30 (16) ◽  
pp. 2095 ◽  
Author(s):  
G. Vaschenko ◽  
F. Brizuela ◽  
C. Brewer ◽  
M. Grisham ◽  
H. Mancini ◽  
...  

2007 ◽  
Vol 33 (11) ◽  
pp. 945-947 ◽  
Author(s):  
I. V. Domracheva ◽  
M. V. Petrenko ◽  
Z. A. Stepanova ◽  
G. K. Tumakaev ◽  
S. V. Bobashev

2008 ◽  
Vol 17 (2) ◽  
pp. 024019 ◽  
Author(s):  
L Ottaviano ◽  
F Bussolotti ◽  
S Piperno ◽  
M Rinaldi ◽  
S Santucci ◽  
...  

Author(s):  
T. I. Ivanov ◽  
E. J. Salumbides ◽  
M. O. Vieitez ◽  
P. C. Cacciani ◽  
C. A. de Lange ◽  
...  

1991 ◽  
Vol 236 ◽  
Author(s):  
Peter R. Herman ◽  
Boyi Chen ◽  
David J. Moore ◽  
Mark Canaga-Retnam

AbstractExcimer lasers sources of 193nm and 157 nm wavelength were used to obtain new photoablation etching rates for several materials of interest to the microelectronics industry. The harder 157nm radiation provided lower ablation rates and smaller threshold fluences for Polyimide and Polymethyl Methacrylate (PMMA) than with 193nm. For normally robust materials like quartz and Teflon (PTFE), the 157nm laser produced clean and smooth ablation sites with low threshold fluences of 620mJ/cm2 and 68mJ/cm2, respectively, features impossible to obtain with conventional excimer lasers at longer wavelengths. The data should help define new micromachining applications of these two materials for the electronic, optical or medical industry. Results are also reported for GaAs and InP based materials which are found to undergo moderate etch rates of 30-80nm/pulse at fluences of ∼3J/cm2, but suffer thermal damage and material segregation due to surface melting.


2011 ◽  
Vol 38 (8) ◽  
pp. 231-234
Author(s):  
V. S. Gorelik ◽  
G. V. Kozlova ◽  
Yu. P. Kurkin ◽  
K. V. Pokazeev

2019 ◽  
Vol 4 (18) ◽  
pp. 5235-5239
Author(s):  
Guanhua Yang ◽  
Haiming Wu ◽  
Anthony M. S. Pembere ◽  
Zhixun Luo

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