Retraction Note: Large-Area Semiconducting Graphene Nanomesh Tailored by Interferometric Lithography

Editor's Note: this Article has been retracted; the Retraction Note is available at https://doi.org/10.1038/s41598-021-84101-3.

Design and Fabrication of Moth-Eye Subwavelength Structure with a Waist on Silicon for Broadband and Wide-Angle Anti-Reflection Property

Reflection loss on the optical component surface is detrimental to performance. Several researchers have discovered that the eyes of moths are covered with micro- and nanostructured films that reduce broadband and wide-angle light reflection. This research proposes a new type of moth-eye subwavelength structure with a waist, which is equivalent to a gradient refractive index film layer with high–low–high hyperbolic-type fill factor distribution. The diffraction order characteristics of a moth-eye subwavelength structure are first analyzed using a rigorous coupled wave analysis. The moth-eye structural parameters are optimized within the spectral range of 2–5 μm using the finite-difference time-domain method. The experimental fabrication of the moth-eye structure with a waist array upon a silicon substrate is demonstrated by using three-beam laser interferometric lithography and an inductively coupled plasma process. The experimental and simulation results show good agreement. The experimental results show that the reflectivity of the moth-eye structure with a waist is less than 1.3% when the incidence angle is less than 30°, and less than 4% when the incidence angle is less than 60°. This research can guide the development of AR broadband optical components and wide-angle applications.

Dynamic Interferometry Lithography on a TiO2Photoresist Sol-Gel for Diffracting Deflector Module

Solar electricity is one of the most promising renewable energy resources. However, the ratio module’s cost/energy produced remains a major issue for classical photovoltaic energy. Many technologies have been developed to solve this problem, by using micro- or nanostructuring on the solar cell or on the module. These kinds of structuring are often used as antireflection and light-trapping tools. In the meantime, other solar technologies are considered, such as concentration photovoltaic modules. This article presents a module combining both approaches, that is, nanostructures and concentration, in order to increase the module’s profitability. Sol-gel derived TiO2diffraction gratings, made by dynamic interferometric lithography, are added on the top of the glass cover to deflect unused light onto the solar cell, increasing the module efficiency.

A novel design strategy for nanoparticles on nanopatterns: interferometric lithographic patterning of Mms6 biotemplated magnetic nanoparticles

Top-down surface patterning technique, interferometric lithography, is combined with bottom-up magnetite nanoparticle biomineralisation using Mms6 to form magnetic nanoscale arrays.