scholarly journals Self-contained in-vacuum in situ thin film stress measurement tool

2018 ◽  
Vol 89 (5) ◽  
pp. 053904 ◽  
Author(s):  
J. Reinink ◽  
R. W. E. van de Kruijs ◽  
F. Bijkerk
Keyword(s):  
Thin Film ◽  
Stress Measurement ◽  
Film Stress ◽  
Measurement Tool ◽  
Thin Film Stress

In-situ thin film stress measurement using high-stability portable holographic interferometer

1996 ◽  
Author(s):  
George E. Dovgalenko ◽  
M. S. Haque ◽  
Anatoli Kniazkov ◽  
Yuri I. Onischenko ◽  
Gregory J. Salamo ◽  
...  
Keyword(s):  
Thin Film ◽  
High Stability ◽  
Stress Measurement ◽  
Film Stress ◽  
Holographic Interferometer ◽  
Thin Film Stress

scholarly journals Measurements Of Stress Evolution During Thin Film Deposition

1996 ◽  
Vol 428 ◽  
Author(s):  
E. Chason ◽  
J. A. Floro
Keyword(s):  
Thin Film ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Film Stress ◽  
Radius Of Curvature ◽  
Stress Evolution ◽  
Rectangular Array ◽  
Thin Film Stress ◽  
Ccd Detector

AbstractWe have developed a technique for measuring thin film stress during growth by monitoring the wafer curvature. By measuring the deflection of multiple parallel laser beams with a CCD detector, the sensitivity to vibration is reduced and a radius of curvature limit of 4 km has been obtained in situ. This technique also enables us to obtain a 2-dimensional profile of the surface curvature from the simultaneous reflection of a rectangular array of beams. Results from the growth of SiGe alloy films are presented to demonstrate the unique information that can be obtained during growth.

Thin film stress measurement by fiber optic strain gage

2006 ◽  
Vol 494 (1-2) ◽  
pp. 141-145 ◽  
Author(s):  
S.M.M. Quintero ◽  
W.G. Quirino ◽  
A.L.C. Triques ◽  
L.C.G. Valente ◽  
A.M.B. Braga ◽  
...  
Keyword(s):  
Thin Film ◽  
Strain Gage ◽  
Fiber Optic ◽  
Stress Measurement ◽  
Film Stress ◽  
Thin Film Stress

Analysis of thin film stress measurement techniques

1997 ◽  
Vol 301 (1-2) ◽  
pp. 45-54 ◽  
Author(s):  
S.G Malhotra ◽  
Z.U Rek ◽  
S.M Yalisove ◽  
J.C Bilello
Keyword(s):  
Thin Film ◽  
Stress Measurement ◽  
Measurement Techniques ◽  
Film Stress ◽  
Thin Film Stress

scholarly journals Measurements of Stress Evolution During Thin Film Deposition

1996 ◽  
Vol 436 ◽  
Author(s):  
E. Chason ◽  
J. A. Floro
Keyword(s):  
Thin Film ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Film Stress ◽  
Radius Of Curvature ◽  
Stress Evolution ◽  
Rectangular Array ◽  
Thin Film Stress ◽  
Ccd Detector

AbstractWe have developed a technique for measuring thin film stress during growth by monitoring the wafer curvature. By measuring the deflection of multiple parallel laser beams with a CCD detector, the sensitivity to vibration is reduced and a radius of curvature limit of 4 km has been obtained in situ. This technique also enables us to obtain a 2-dimensional profile of the surface curvature from the simultaneous reflection of a rectangular array of beams. Results from the growth of SiGe alloy films are presented to demonstrate the unique information that can be obtained during growth.

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