Additive Contributions to Cu Thin Film Stress Evolution via In Situ Surface Stress Monitoring

2010 ◽  
Keyword(s):  
Thin Film ◽  
Surface Stress ◽  
Film Stress ◽  
Stress Evolution ◽  
Stress Monitoring ◽  
Thin Film Stress ◽  
Cu Thin Film

scholarly journals Measurements Of Stress Evolution During Thin Film Deposition

1996 ◽  
Vol 428 ◽  
Author(s):  
E. Chason ◽  
J. A. Floro
Keyword(s):  
Thin Film ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Film Stress ◽  
Radius Of Curvature ◽  
Stress Evolution ◽  
Rectangular Array ◽  
Thin Film Stress ◽  
Ccd Detector

AbstractWe have developed a technique for measuring thin film stress during growth by monitoring the wafer curvature. By measuring the deflection of multiple parallel laser beams with a CCD detector, the sensitivity to vibration is reduced and a radius of curvature limit of 4 km has been obtained in situ. This technique also enables us to obtain a 2-dimensional profile of the surface curvature from the simultaneous reflection of a rectangular array of beams. Results from the growth of SiGe alloy films are presented to demonstrate the unique information that can be obtained during growth.

scholarly journals Measurements of Stress Evolution During Thin Film Deposition

1996 ◽  
Vol 436 ◽  
Author(s):  
E. Chason ◽  
J. A. Floro
Keyword(s):  
Thin Film ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Film Stress ◽  
Radius Of Curvature ◽  
Stress Evolution ◽  
Rectangular Array ◽  
Thin Film Stress ◽  
Ccd Detector

AbstractWe have developed a technique for measuring thin film stress during growth by monitoring the wafer curvature. By measuring the deflection of multiple parallel laser beams with a CCD detector, the sensitivity to vibration is reduced and a radius of curvature limit of 4 km has been obtained in situ. This technique also enables us to obtain a 2-dimensional profile of the surface curvature from the simultaneous reflection of a rectangular array of beams. Results from the growth of SiGe alloy films are presented to demonstrate the unique information that can be obtained during growth.

scholarly journals Self-contained in-vacuum in situ thin film stress measurement tool

2018 ◽  
Vol 89 (5) ◽  
pp. 053904 ◽  
Author(s):  
J. Reinink ◽  
R. W. E. van de Kruijs ◽  
F. Bijkerk
Keyword(s):  
Thin Film ◽  
Stress Measurement ◽  
Film Stress ◽  
Measurement Tool ◽  
Thin Film Stress

Thin Film Stress Measurement with a Tunneling Sensor

1998 ◽  
Vol 546 ◽  
Author(s):  
P. Zhang ◽  
R. P. Vinci ◽  
J. C. Bravman ◽  
T. W. Kenny
Keyword(s):  
Thin Film ◽  
Stress Measurement ◽  
Thin Film Deposition ◽  
In Situ Stress ◽  
Film Deposition ◽  
Film Stress ◽  
Stress Monitoring ◽  
Thin Film Stress ◽  
Basic Measurement ◽  
A New Technique

AbstractA new technique of measuring thin film stress with a tunneling sensor is presented. Basic measurement concepts, preliminary results on thin film stress measurement, and fabrication processes for the tunneling stress measurement sensor are described. The feasibility of implementing this technique for in-situ stress monitoring during thin film deposition demonstrated.

In-situ thin film stress measurement using high-stability portable holographic interferometer

1996 ◽  
Author(s):  
George E. Dovgalenko ◽  
M. S. Haque ◽  
Anatoli Kniazkov ◽  
Yuri I. Onischenko ◽  
Gregory J. Salamo ◽  
...  
Keyword(s):  
Thin Film ◽  
High Stability ◽  
Stress Measurement ◽  
Film Stress ◽  
Holographic Interferometer ◽  
Thin Film Stress
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