High Resolution Imaging of Physisorbed Organic Monolayers by Scanning Tunneling Microscopy

1993 ◽  
Vol 229 (1) ◽  
pp. 235-240 ◽  
Author(s):  
D. Ricci ◽  
A. Bonfiglio ◽  
S. Cincotti ◽  
E. Di Zitti ◽  
L. Elementi
Keyword(s):  
High Resolution ◽  
Scanning Tunneling Microscopy ◽  
Scanning Tunneling ◽  
High Resolution Imaging ◽  
Tunneling Microscopy ◽  
Organic Monolayers ◽  
Resolution Imaging

scholarly journals Can Dew Help us to Image Insulating Material?

1995 ◽  
Vol 3 (1) ◽  
pp. 18-21
Author(s):  
Stephen W. Carmichael
Keyword(s):  
High Resolution ◽  
Scanning Tunneling Microscopy ◽  
Electron Flow ◽  
Scanning Tunneling ◽  
High Resolution Imaging ◽  
Tunneling Microscopy ◽  
Insulating Material ◽  
Metal Atoms ◽  
New Development ◽  
Resolution Imaging

In high resolution imaging of biologic structure, atomic lorce microscopy (AFM) has been prevailing over scanning tunneling microscopy (STM). This is primarily because biologic materials do not conduct electricity, and STM requires that electrons flow to or from the surface of the specimen, whereas electron flow is not required for AFM. Microscopists intent on using STM have compensated by coating specimens with a thin coat of metal. However, the presence of metal atoms on the surface degrades the resolution. A new development may make STM more useful to biologists than ever before.

High-Resolution Imaging of the Intramolecular Structure of Indomethacin−Carrying Dendrimers by Scanning Tunneling Microscopy

ACS Nano ◽  
2011 ◽  
Vol 5 (3) ◽  
pp. 1685-1692 ◽  
Author(s):  
Christopher J. Fleming ◽  
Nai-Ning Yin ◽  
Shawn L. Riechers ◽  
Gabriel Chu ◽  
Gang-yu Liu
Keyword(s):  
High Resolution ◽  
Scanning Tunneling Microscopy ◽  
Scanning Tunneling ◽  
High Resolution Imaging ◽  
Tunneling Microscopy ◽  
Resolution Imaging

scholarly journals High-Resolution Imaging with Atomic Force Microscopy

2004 ◽  
Vol 12 (5) ◽  
pp. 12-15
Author(s):  
Sergei Magonov
Keyword(s):  
Atomic Force Microscopy ◽  
High Resolution ◽  
Atomic Scale ◽  
Scanning Tunneling ◽  
High Resolution Imaging ◽  
Tunneling Microscopy ◽  
Detection Scheme ◽  
Force Microscopy ◽  
Atomic Force ◽  
Resolution Imaging

The invention of scanning tunneling microscopy (STM) in 1982 revolutionized surface analysis by providing atomic-scale surface imaging of conducting and semiconducting materials. Shortly after that, atomic force microscopy (AFM) was introduced as an accessory of STM for high-resolution imaging of surfaces independent of their conductivity. Mechanical force interactions between a sharp tip placed at one end of a micro fabricated cantilever and a sample surface were employed for imaging in this method. In the past decade, AFM has developed into a leading scanning probe technique applied in many fields of fundamental and industrial research. The progress of AFM has been made possible by implementation of an optical level detection scheme, which allows precise measuring of the cantilever deflection caused by the tip-sample forces, by mass microfabrication of probes consisting of cantilevers, and by developments of oscillatory imaging modes, particularly, Tapping ModeTM.

Practical applications of scanning tunneling microscopy

1989 ◽  
Vol 47 ◽  
pp. 18-19
Author(s):  
D. R. Denley
Keyword(s):  
High Resolution ◽  
Scanning Tunneling Microscopy ◽  
Quantitative Information ◽  
Digital Data ◽  
Scanning Tunneling ◽  
Ambient Atmosphere ◽  
Tunneling Microscopy ◽  
Clear Trend ◽  
Practical Applications ◽  
Promising Tool

Scanning tunneling microscopy (STM) has recently been introduced as a promising tool for analyzing surface atomic structure. We have used STM for its extremely high resolution (especially the direction normal to surfaces) and its ability for imaging in ambient atmosphere. We have examined surfaces of metals, semiconductors, and molecules deposited on these materials to achieve atomic resolution in favorable cases.When the high resolution capability is coupled with digital data acquisition, it is simple to get quantitative information on surface texture. This is illustrated for the measurement of surface roughness of evaporated gold films as a function of deposition temperature and annealing time in Figure 1. These results show a clear trend for which the roughness, as well as the experimental deviance of the roughness is found to be minimal for evaporation at 300°C. It is also possible to contrast different measures of roughness.

Sign in / Sign up

Export Citation Format

Share Document