Study of Hf—Al—O High-k Gate Dielectric Thin Films Grown on Si

2003 ◽  
Vol 57 (1) ◽  
pp. 1213-1219 ◽  
Author(s):  
P. F. Lee ◽  
J. Y. Dai ◽  
H. L. W. Chan ◽  
C. L. Choy
Keyword(s):  
Thin Films ◽  
Gate Dielectric ◽  
Dielectric Thin Films ◽  
High K ◽  
High K Gate Dielectric

Two-step interfacial reaction of HfO2 high-k gate dielectric thin films on Si

2004 ◽  
Vol 30 (7) ◽  
pp. 1267-1270 ◽  
Author(s):  
P.F. Lee ◽  
J.Y. Dai ◽  
H.L.W. Chan ◽  
C.L. Choy
Keyword(s):  
Thin Films ◽  
Interfacial Reaction ◽  
Gate Dielectric ◽  
Dielectric Thin Films ◽  
High K ◽  
High K Gate Dielectric

Investigation of strontium tantalate thin films for high-k gate dielectric applications

2006 ◽  
Vol 9 (6) ◽  
pp. 1102-1107 ◽  
Author(s):  
M. Silinskas ◽  
M. Lisker ◽  
B. Kalkofen ◽  
E.P. Burte
Keyword(s):  
Thin Films ◽  
Gate Dielectric ◽  
High K ◽  
High K Gate Dielectric

High quality, high-k gate dielectric: amorphous LaAlO3 thin films grown on Si(100) without Si interfacial layer

2003 ◽  
Vol 77 (5) ◽  
pp. 721-724 ◽  
Author(s):  
L. Yan ◽  
H.B. Lu ◽  
G.T. Tan ◽  
F. Chen ◽  
Y.L. Zhou ◽  
...  
Keyword(s):  
Thin Films ◽  
Interfacial Layer ◽  
Gate Dielectric ◽  
High Quality ◽  
High K ◽  
High K Gate Dielectric
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