Electronic structure of disordered alloys-local environment effects

1976 ◽  
Vol 9 (14) ◽  
pp. 2733-2737 ◽  
Author(s):  
V Kumar ◽  
D Kumar ◽  
S K Joshi
1973 ◽  
Vol 3 (12) ◽  
pp. 2120-2125 ◽  
Author(s):  
F Brouers ◽  
F Ducastelle ◽  
F Gautier ◽  
J Van Der Rest

1985 ◽  
Vol 77-78 ◽  
pp. 87-90 ◽  
Author(s):  
Jan Mašek ◽  
Václav Drchal ◽  
Jiří Málek ◽  
Bedřich Velický ◽  
Steffen Wilke

2017 ◽  
Vol 95 (1) ◽  
Author(s):  
Saleem Ayaz Khan ◽  
Ján Minár ◽  
Hubert Ebert ◽  
Peter Blaha ◽  
Ondřej Šipr

1974 ◽  
Vol 35 (C4) ◽  
pp. C4-89-C4-94 ◽  
Author(s):  
F. BROUERS ◽  
F. DUCASTELLE ◽  
F. GAUTIER ◽  
J. VAN DER REST

1992 ◽  
Vol 46 (16) ◽  
pp. 10432-10436 ◽  
Author(s):  
J. Dorantes-Da´vila ◽  
H. Dreysse´ ◽  
G. M. Pastor

1992 ◽  
Vol 46 (12) ◽  
pp. 7358-7362 ◽  
Author(s):  
M. Yu. Nikolaev ◽  
L. M. Roth ◽  
A. V. Vedyaev

1999 ◽  
Vol 5 (S2) ◽  
pp. 120-121
Author(s):  
D. A. Muller ◽  
T. Sorsch ◽  
S. Moccio ◽  
F. H. Baumann ◽  
K. Evans-Lutterodt ◽  
...  

The transistors planned for commercial use ten years from now in many electronic devices will have gate lengths shorter than 130 atoms, gate oxides thinner than 1.2 nm of SiO2 and clock speeds in excess of 10 GHz. It is now technologically possible to produce such transistors with gate oxides only 5 silicon atoms thick[l]. Since at least two of those 5 atoms are not in a local environment similar to either bulk Si or bulk SiO2, the properties of the interface are responsible for a significant fraction of the “bulk” properties of the gate oxide. However the physical (and especially their electrical) properties of the interfacial atoms are very different from .bulk Si or bulk SiO2. Further, roughness on an atomic scale can alter the leakage current by orders of magnitude.In our studies of such devices, we found that thermal oxidation tends to produce Si/SiO2 interfaces with 0.1-0.2 nm rms roughness.


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