Harnessing entropic and enthalpic contributions to create a negative tone chemically amplified molecular resist for high-resolution lithography

2014 ◽  
Vol 25 (31) ◽  
pp. 315301 ◽  
Author(s):  
Prashant K Kulshreshtha ◽  
Ken Maruyama ◽  
Sara Kiani ◽  
James Blackwell ◽  
Deirdre L Olynick ◽  
...  
Keyword(s):  
High Resolution ◽  
Chemically Amplified ◽  
Negative Tone

Negative tone chemically amplified resist formulation optimizations for ultra high-resolution lithography

2003 ◽  
Vol 67-68 ◽  
pp. 274-282 ◽  
Author(s):  
J. Saint-Pol ◽  
S. Landis ◽  
C. Gourgon ◽  
S. Tedesco ◽  
R. Hanawa ◽  
...  
Keyword(s):  
High Resolution ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Negative Tone

High-Resolution Hybrid Lithography with Negative Tone Chemically Amplified Resists

2004 ◽  
Vol 43 (6B) ◽  
pp. 3974-3980 ◽  
Author(s):  
S. Landis ◽  
S. Pauliac ◽  
J. Saint-Pol ◽  
C. Gourgon ◽  
M. Akita ◽  
...  
Keyword(s):  
High Resolution ◽  
Chemically Amplified ◽  
Negative Tone ◽  
Chemically Amplified Resists

High-resolution negative-tone chemically amplified i-line resists

1999 ◽  
Author(s):  
Edward W. Rutter, Jr. ◽  
Jonathan C. Root ◽  
Larry F. Bacchetti
Keyword(s):  
High Resolution ◽  
Chemically Amplified ◽  
Negative Tone

Resist composition effects on ultimate resolution of negative-tone chemically amplified resists

2001 ◽  
Author(s):  
Laurent Pain ◽  
C. Gourgon ◽  
K. Patterson ◽  
B. Scarfogliere ◽  
Serge V. Tedesco ◽  
...  
Keyword(s):  
Composition Effects ◽  
Chemically Amplified ◽  
Negative Tone ◽  
Chemically Amplified Resists

INR negative resist: a negative-tone I-line chemically amplified photoresist

1994 ◽  
Author(s):  
Leo L. Linehan ◽  
Gary T. Spinillo ◽  
Randolph S. Smith ◽  
Wayne M. Moreau ◽  
Barry C. McCormick ◽  
...  
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Photoresist ◽  
Negative Tone

One-component chemically amplified resist composed of polymeric sulfonium salt PAGs for high resolution patterning

2019 ◽  
Vol 114 ◽  
pp. 11-18 ◽  
Author(s):  
Qianqian Wang ◽  
Chenying Zhang ◽  
Chenfeng Yan ◽  
Fengjuan You ◽  
Liyuan Wang
Keyword(s):  
High Resolution ◽  
Sulfonium Salt ◽  
Chemically Amplified ◽  
Chemically Amplified Resist

scholarly journals Novel chemically amplified dry-developing imaging materials for high resolution microlithography.

1992 ◽  
Vol 5 (1) ◽  
pp. 17-29 ◽  
Author(s):  
J.M.J. Frchet ◽  
J. Fahey ◽  
S. M. Lee ◽  
S. Matuszczak ◽  
Y. Shacham-Diamand ◽  
...  
Keyword(s):  
High Resolution ◽  
Chemically Amplified
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