Flux creep, flux pinning and critical current density of Y-, Gd-, and Tl-based superconductive thin films

1994 ◽  
Vol 3 (2) ◽  
pp. 124-130
Author(s):  
Shi Zhi-xiang ◽  
Ji He-lin ◽  
Zhang Yi-tong ◽  
Jin Xin ◽  
Xu Xiao-nong ◽  
...  
Keyword(s):  
Thin Films ◽  
Critical Current Density ◽  
Critical Current ◽  
Current Density ◽  
Flux Pinning ◽  
Flux Creep

Critical current density and flux pinning in Gd1−xYxBa2Cu3O7−y epitaxial thin films

1995 ◽  
Vol 250 (1-2) ◽  
pp. 55-58 ◽  
Author(s):  
R.L. Wang ◽  
H.C. Li ◽  
B. Yin ◽  
J.W. Li ◽  
X.S. Ron ◽  
...  
Keyword(s):  
Thin Films ◽  
Critical Current Density ◽  
Critical Current ◽  
Current Density ◽  
Flux Pinning ◽  
Epitaxial Thin Films

Critical current density and flux creep in epitaxial YBa2Cu3O7−x thin films

Cryogenics ◽  
1990 ◽  
Vol 30 (5) ◽  
pp. 448-450 ◽  
Author(s):  
G.C. Xiong ◽  
F.R. Wang ◽  
S.Z. Wang ◽  
Q.D. Jiang ◽  
J.Y. Li ◽  
...  
Keyword(s):  
Thin Films ◽  
Critical Current Density ◽  
Critical Current ◽  
Current Density ◽  
Flux Creep

Microstructural characterization of YBa2Cu3O7-x thin films formed by metalorganic CVD

1991 ◽  
Vol 49 ◽  
pp. 1080-1081
Author(s):  
P. Lu ◽  
W. Huang ◽  
C.S. Chern ◽  
Y.Q. Li ◽  
J. Zhao ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Critical Current Density ◽  
Critical Current ◽  
Current Density ◽  
Film Growth ◽  
Chemical Vapor ◽  
Microstructural Characterization ◽  
Ion Milling ◽  
Conventional Grinding

The YBa2Cu3O7-x thin films formed by metalorganic chemical vapor deposition(MOCVD) have been reported to have excellent superconducting properties including a sharp zero resistance transition temperature (Tc) of 89 K and a high critical current density of 2.3x106 A/cm2 or higher. The origin of the high critical current in the thin film compared to bulk materials is attributed to its structural properties such as orientation, grain boundaries and defects on the scale of the coherent length. In this report, we present microstructural aspects of the thin films deposited on the (100) LaAlO3 substrate, which process the highest critical current density.Details of the thin film growth process have been reported elsewhere. The thin films were examined in both planar and cross-section view by electron microscopy. TEM sample preparation was carried out using conventional grinding, dimpling and ion milling techniques. Special care was taken to avoid exposure of the thin films to water during the preparation processes.

Effects of surface damage on critical current density in MgB2 thin films

2021 ◽  
Vol 22 ◽  
pp. 14-19
Author(s):  
Soon-Gil Jung ◽  
Duong Pham ◽  
Jung Min Lee ◽  
Yoonseok Han ◽  
Won Nam Kang ◽  
...  
Keyword(s):  
Thin Films ◽  
Critical Current Density ◽  
Critical Current ◽  
Current Density ◽  
Surface Damage ◽  
Mgb2 Thin Films
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