A novel algorithm for designing diffractive optical elements for two colour far-field pattern formation

2005 ◽  
Vol 7 (6) ◽  
pp. S276-S279 ◽  
Author(s):  
A J Caley ◽  
A J Waddie ◽  
M R Taghizadeh
Keyword(s):  
Pattern Formation ◽  
Field Pattern ◽  
Far Field ◽  
Diffractive Optical Elements ◽  
Optical Elements ◽  
Far Field Pattern ◽  
Novel Algorithm

Far-field pattern formation by manipulating the topological charges of square-shaped optical vortex lattices

2018 ◽  
Vol 35 (2) ◽  
pp. 402 ◽  
Author(s):  
L. Stoyanov ◽  
G. Maleshkov ◽  
M. Zhekova ◽  
I. Stefanov ◽  
D. N. Neshev ◽  
...  
Keyword(s):  
Pattern Formation ◽  
Optical Vortex ◽  
Field Pattern ◽  
Far Field ◽  
Vortex Lattices ◽  
Far Field Pattern ◽  
Topological Charges

Effect of transverse mode structure on the far field pattern of metal-metal terahertz quantum cascade lasers

2008 ◽  
Vol 104 (12) ◽  
pp. 124513 ◽  
Author(s):  
P. Gellie ◽  
W. Maineult ◽  
A. Andronico ◽  
G. Leo ◽  
C. Sirtori ◽  
...  
Keyword(s):  
Quantum Cascade Lasers ◽  
Transverse Mode ◽  
Field Pattern ◽  
Far Field ◽  
Mode Structure ◽  
Quantum Cascade ◽  
Metal Metal ◽  
Far Field Pattern ◽  
Cascade Lasers

Far-field patterns of line sources mounted between four-dielectric substrates

1992 ◽  
Vol 70 (2-3) ◽  
pp. 173-178 ◽  
Author(s):  
Ioanna Diamandi ◽  
Costas Mertzianidis ◽  
John N. Sahalos
Keyword(s):  
Remote Sensing ◽  
Line Source ◽  
Dielectric Substrate ◽  
Microstrip Antennas ◽  
Field Pattern ◽  
Substrate Thickness ◽  
Far Field ◽  
Dielectric Substrates ◽  
Field Patterns ◽  
Far Field Pattern

The far-field pattern characteristics of line sources lying between the slabs of a four-dielectric substrate configuration are presented. The patterns are calculated for several cases of the substrate thickness as well as for several line-source locations. The considerations that are made give useful applications in remote sensing and microstrip antennas.

scholarly journals Second harmonic generation from 3D nanoantennas: on the surface and bulk contributions by far-field pattern analysis

2011 ◽  
Vol 19 (27) ◽  
pp. 26752 ◽  
Author(s):  
Alessio Benedetti ◽  
Marco Centini ◽  
Mario Bertolotti ◽  
Concita Sibilia
Keyword(s):  
Second Harmonic Generation ◽  
Harmonic Generation ◽  
Pattern Analysis ◽  
Second Harmonic ◽  
Field Pattern ◽  
Far Field ◽  
Far Field Pattern

scholarly journals Scattering centers modeling of non-anechoic measurement environments

2012 ◽  
Vol 10 ◽  
pp. 69-73 ◽  
Author(s):  
K. A. Yinusa ◽  
C. H. Schmidt ◽  
T. F. Eibert
Keyword(s):  
Near Field ◽  
Field Measurements ◽  
Field Pattern ◽  
Far Field ◽  
Scattering Centers ◽  
Field Transformation ◽  
Field Radiation ◽  
Echo Suppression ◽  
Multipath Signals ◽  
Far Field Pattern

Abstract. Near-field measurements are established techniques to obtain the far-field radiation pattern of an Antenna Under Test via near-field measurements and subsequent near-field far-field transformation. For measurements acquired in echoic environments, additional post-processing is required to eliminate the effects of multipath signals in the resulting far-field pattern. One of such methods models the measurement environment as a multiple source scenario whereby the collected near-field data is attributed to the AUT and some scattering centers in the vicinity of the AUT. In this way, the contributions of the AUT at the probe can be separated from those of the disturbers during the near-field far-field transformation if the disturber locations are known. In this paper, we present ways of modeling the scattering centers on equivalent surfaces such that echo suppression is possible with only partial or no information about the geometry of the scatterers.

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