New approach to the electron-muon mass ratio

1977 ◽  
Vol 15 (9) ◽  
pp. 2652-2654 ◽  
Author(s):  
S. M. Barr ◽  
A. Zee
Keyword(s):  
2003 ◽  
Vol 66 (5) ◽  
pp. 893-901 ◽  
Author(s):  
N. A. Boikova ◽  
S. V. Kleshchevskaya ◽  
Yu. N. Tyukhtyaev ◽  
R. N. Faustov

1975 ◽  
Vol 88 (2) ◽  
pp. 337-348
Author(s):  
D. Dillenburg ◽  
Th.A.J. Maris
Keyword(s):  

1978 ◽  
Vol 59 (2) ◽  
pp. 571-578 ◽  
Author(s):  
K. Nishijima ◽  
H. Sato
Keyword(s):  

2011 ◽  
Vol 418-420 ◽  
pp. 651-655
Author(s):  
Qing Xu ◽  
Zhao Ting Yang ◽  
Chao Rong Li ◽  
Ben Yong Chen ◽  
Wen Jun Dong

Wrinkle is a favorable template for patterning cells or particles. A new approach is developed to control and fabricate PS colloidal crystals with the reversible wrinkle on PDMS substrate/Pt film stressed system. The obtained structure is characterized by optical microscope and scanning electron microscope. It demonstrates that the settlement of colloids can be regulated by the buckling wavelength which can be tuned by varying the film thickness and substrate mixture mass ratio. Compared with monolayer PS film patterned on herringbones pattern wrinkle, the film on stripes pattern wrinkle always has low defect rate. It is meaningful for fabricating large-scale regular spacing and high-ordered PS colloid films.


1973 ◽  
Vol 61 ◽  
pp. 230-244 ◽  
Author(s):  
J. Frenkel ◽  
M.E. Ebel
Keyword(s):  

1971 ◽  
Vol 2 (3) ◽  
pp. 109-114 ◽  
Author(s):  
F. R. Tangherlini

1974 ◽  
Vol 9 (12) ◽  
pp. 3456-3460 ◽  
Author(s):  
Patrizio Vinciarelli
Keyword(s):  

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