Monte-Carlo Based Optical Proximity Correction For The Half-Tone Phase Shift Mask

Digest of Papers. Microprocesses and Nanotechnology'98. 198 International Microprocesses and Nanotechnology Conference (Cat. No.98EX135) ◽

10.1109/imnc.1998.729964 ◽

1998 ◽

Keyword(s):

Monte Carlo ◽

Phase Shift ◽

Optical Proximity Correction ◽

Phase Shift Mask

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Monte-Carlo-Based Automatic Design of Chromeless Phase Shift Mask

Japanese Journal of Applied Physics ◽

10.1143/jjap.43.514 ◽

2004 ◽

Vol 43 (2) ◽

pp. 514-517

Author(s):

Jai-Cheol Lee ◽

Yong-Ho Oh ◽

Sungwoo Lim ◽

Chun Soo Go ◽

Sung Su Roh

Keyword(s):

Monte Carlo ◽

Phase Shift ◽

Automatic Design ◽

Phase Shift Mask

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Integration of alternating phase-shift mask technology into optical proximity correction

10.1117/12.354367 ◽

1999 ◽

Author(s):

Joerg Thiele ◽

Christoph M. Friedrich ◽

Christoph Dolainsky ◽

Paul Karakatsanis ◽

Wilhelm Maurer

Keyword(s):

Phase Shift ◽

Optical Proximity Correction ◽

Phase Shift Mask ◽

Alternating Phase Shift Mask

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Reduction of CD variance by using optical proximity correction for patterning with DUV phase shift mask

Microelectronic Engineering ◽

10.1016/0167-9317(95)00208-1 ◽

1996 ◽

Vol 30 (1-4) ◽

pp. 119-122

Author(s):

H. Zhang

Keyword(s):

Phase Shift ◽

Optical Proximity Correction ◽

Phase Shift Mask

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Shape engineering: A novel optical proximity correction technique for attenuated phase-shift mask

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.1313570 ◽

2000 ◽

Vol 18 (6) ◽

pp. 2896

Author(s):

S. Pau ◽

K. Bolan ◽

M. Blakey ◽

O. Nalamasu

Keyword(s):

Phase Shift ◽

Optical Proximity Correction ◽

Correction Technique ◽

Phase Shift Mask

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Relationship of phase shift mask design and size of three-dimension nanostructures

2020 27th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD) ◽

10.23919/am-fpd49417.2020.9224493 ◽

2020 ◽

Author(s):

Pongsakom Sihapitak ◽

Yasuaki Ishikawa ◽

Xudongfang Wang ◽

Mutsunori Uenuma ◽

Yukiharu Uraoka

Keyword(s):

Phase Shift ◽

Three Dimension ◽

Mask Design ◽

Relationship Of ◽

Phase Shift Mask

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Preliminary study of 65 nm node alternating phase-shift mask fabrication

10.1117/12.467487 ◽

2002 ◽

Author(s):

Kouji Hosono ◽

Naoyuki Ishiwata ◽

Satoru Asai ◽

Hiroshi Maruyama ◽

Yutaka Miyahara ◽

...

Keyword(s):

Phase Shift ◽

Preliminary Study ◽

Phase Shift Mask ◽

Alternating Phase Shift Mask ◽

Mask Fabrication

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Application of alternating phase shift mask to device fabrication

10.1117/12.209281 ◽

1995 ◽

Author(s):

Sunggi Kim ◽

Sang-Gyun Woo ◽

Woo-Sung Han ◽

Young-Bum Koh ◽

Moon-Yong Lee

Keyword(s):

Phase Shift ◽

Device Fabrication ◽

Phase Shift Mask ◽

Alternating Phase Shift Mask

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Sidewall profile inclination modulation mask (SPIMM): modification of an attenuated phase-shift mask for single-exposure double and multiple patterning

10.1117/12.2008886 ◽

2013 ◽

Author(s):

Frederick T. Chen ◽

Wei-Su Chen ◽

Ming-Jinn Tsai ◽

Tzu-Kun Ku

Keyword(s):

Phase Shift ◽

Single Exposure ◽

Phase Shift Mask

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Second level exposure for phase shift mask applications using an SLM-based DUV mask writer

10.1117/12.617359 ◽

2005 ◽

Author(s):

Mahesh Chandramouli ◽

Bob Olshausen ◽

Yulia Korobko ◽

Sven Henrichs ◽

Ping Qu ◽

...

Keyword(s):

Phase Shift ◽

Phase Shift Mask

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Primary processes in e-beam and laser lithographies for phase-shift mask manufacturing II

10.1117/12.142150 ◽

1993 ◽

Author(s):

Masa-aki Kurihara ◽

Masumi Arai ◽

Hiroshi Fujita ◽

Hisashi Moro-oka ◽

Yoichi Takahashi ◽

...

Keyword(s):

Phase Shift ◽

Phase Shift Mask

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