optical proximity correction Recently Published Documents

Machine Learning Methods

Distributed optical proximity correction with deep-learning lithographic model for i-line photolithography

Emerging Topics in Artificial Intelligence (ETAI) 2021 ◽

10.1117/12.2593408 ◽

2021 ◽

Author(s):

Wei Ping Liao ◽

Yu Fan Lin ◽

Hsueh Li Liu ◽

Shu De Gong Gong ◽

Peichen Yu ◽

...

Keyword(s):

Deep Learning ◽

Efficient optical proximity correction based on virtual edge and mask pixelation with two-phase sampling

Optics Express ◽

10.1364/oe.415913 ◽

2021 ◽

Author(s):

Guodong Chen ◽

Sikun Li ◽

Xiangzhao Wang

Keyword(s):

Two Phase ◽

Phase Sampling ◽

Two Phase Sampling

Optical Proximity Correction, Methodology and Limitations

2021 China Semiconductor Technology International Conference (CSTIC) ◽

10.1109/cstic52283.2021.9461507 ◽

2021 ◽

Author(s):

Yongqiang Hou ◽

Qiang Wu

Keyword(s):

Fast optical proximity correction based on graph convolution network

Optical Microlithography XXXIV ◽

10.1117/12.2583773 ◽

2021 ◽

Author(s):

Shengen Zhang ◽

Xu Ma ◽

Junbi Zhang ◽

Rui Chen ◽

Yihua Pan ◽

...

Keyword(s):

Optical Proximity Correction Using Bidirectional Recurrent Neural Network with Attention Mechanism

IEEE Transactions on Semiconductor Manufacturing ◽

10.1109/tsm.2021.3072668 ◽

2021 ◽

pp. 1-1

Author(s):

Yonghwi Kwon ◽

Youngsoo Shin

Keyword(s):

Neural Network ◽

Recurrent Neural Network ◽

Attention Mechanism ◽

Machine Learning based Optical Proximity Correction Techniques

Journal of Microelectronic Manufacturing ◽

10.33079/jomm.20030408 ◽

2020 ◽

Vol 3 (4) ◽

pp. 1-8

Author(s):

Pengpeng Yuan ◽

◽

Taian Fan ◽

Yaobin Feng ◽

Peng Xu ◽

...

Keyword(s):

Machine Learning ◽

Fast optimization of defect compensation and optical proximity correction for extreme ultraviolet lithography mask

Optics Communications ◽

10.1016/j.optcom.2019.07.029 ◽

2019 ◽

Vol 452 ◽

pp. 169-180 ◽

Cited By ~ 1

Author(s):

Heng Zhang ◽

Sikun Li ◽

Xiangzhao Wang ◽

Zejiang Meng ◽

Wei Cheng

Keyword(s):

Extreme Ultraviolet ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography ◽

Fast Optimization

Optical proximity correction using bidirectional recurrent neural network (BRNN)

Design-Process-Technology Co-optimization for Manufacturability XIII ◽

10.1117/12.2515159 ◽

2019 ◽

Author(s):

Yonghwi Kwon ◽

Youngsoo Song ◽

Youngsoo Shin

Keyword(s):

Neural Network ◽

Recurrent Neural Network ◽

Efficient optical proximity correction based on semi-implicit additive operator splitting

Optics Express ◽

10.1364/oe.27.001520 ◽

2019 ◽

Vol 27 (2) ◽

pp. 1520 ◽

Cited By ~ 4

Author(s):

Yijiang Shen ◽

Fei Peng ◽

Zhenrong Zhang

Keyword(s):

Operator Splitting ◽

Additive Operator ◽

Additive Operator Splitting