scholarly journals Fabrication of a MEMS Micromirror Based on Bulk Silicon Micromachining Combined With Grayscale Lithography

2020 ◽  
Vol 29 (5) ◽  
pp. 734-740
Author(s):  
Ines S. Garcia ◽  
Carlos Ferreira ◽  
Joana D. Santos ◽  
Marco Martins ◽  
Rosana A. Dias ◽  
...  
2011 ◽  
Vol 18 (1) ◽  
pp. 37-42 ◽  
Author(s):  
Xiao-Xiao Yan ◽  
Jing-Quan Liu ◽  
Xiu-Cheng Shen ◽  
Chun-Sheng Yang

1996 ◽  
Vol 459 ◽  
Author(s):  
G. Kaltsas ◽  
A. G. Nassiopoulos

ABSTRACTA fully C-MOS compatible process for bulk silicon micromachining using porous silicon technology and front-side lithography is developed. The process is based on the use of porous silicon as a sacrificial layer for the fabrication of deep cavities into monocrystalline silicon, so as to avoid back side lithography. Cavities as deep as several hundreds of micrometers are produced with very smooth surface and sidewalls. The process is used to produce : a) suspended monocrystalline silicon membranes, b) free standing polysilicon membranes in the form of bridges or cantilevers with lateral dimensions from a few μms to several hundreds of μms. Important applications to silicon integrated devices as sensors, actuators, detectors etc., are foreseen.


2007 ◽  
Vol 38 (1) ◽  
pp. 120-124 ◽  
Author(s):  
Xiang-meng Jing ◽  
Di Chen ◽  
Dong-ming Fang ◽  
Chuang Huang ◽  
Jing-quan Liu ◽  
...  

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