Large area deposition technique for PECVD of amorphous silicon [solar cells]

Author(s):  
U. Stephan ◽  
J. Kuske ◽  
W. Frammelsberger ◽  
P. Lechner ◽  
W. Psyk ◽  
...  
2003 ◽  
Vol 42 (Part 2, No. 11A) ◽  
pp. L1312-L1314 ◽  
Author(s):  
Akihiro Takano ◽  
Masayuki Tanda ◽  
Makoto Shimosawa ◽  
Takehito Wada ◽  
Tomoyoshi Kamoshita

Author(s):  
T. IHARA ◽  
K. KAWATE ◽  
S. FUJIKAKE ◽  
H. SATO ◽  
S. SAITOH ◽  
...  

Author(s):  
L. Raniero ◽  
N. Martins ◽  
P. Canhola ◽  
S. Pereira ◽  
I. Ferreira ◽  
...  

1989 ◽  
Vol 149 ◽  
Author(s):  
R. E. I. Schropp ◽  
K. Adachi ◽  
N. Imajyo ◽  
J. A. Del Cueto ◽  
P. K. Bhat ◽  
...  

ABSTRACTWe report on the development of the first large area semi-transparent amorphous silicon solar modules on pre-shaped compound curved substrates. To date, we have achieved an active area (approximately 1800 cm2) efficiency of about 7%. It is shown that, because of enhanced internal reflection, a metal/dielectric back contact is a good alternative to one consisting of merely a transparent conducting oxide (TCO). The dielectric serves as both a passivating layer and an anti-reflection coating.


Solar Cells ◽  
1986 ◽  
Vol 17 (2-3) ◽  
pp. 191-200 ◽  
Author(s):  
Tokumi Mase ◽  
Hiroshi Takei ◽  
Makoto Konagai ◽  
Kiyoshi Takahashi

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