Properties of rf‐sputtered Al2O3 films deposited by planar magnetron

Journal of Vacuum Science and Technology ◽

10.1116/1.569103 ◽

1977 ◽

Vol 14 (1) ◽

pp. 127-133 ◽

Author(s):

R. S. Nowicki

Keyword(s):

Planar Magnetron ◽

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Insight of mechanical and morphological properties of ALD- Al2O3 films in point of structural properties

Applied Physics A ◽

10.1007/s00339-021-04601-x ◽

2021 ◽

Vol 127 (6) ◽

Author(s):

Burak Nalcaci ◽

Meryem Polat Gonullu

Keyword(s):

Structural Properties ◽

Morphological Properties ◽

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Nonlinear optical properties of LiNbO3/Al2O3 films epitaxially grown by pulsed laser deposition

Integrated Ferroelectrics ◽

10.1080/10584589808238763 ◽

1998 ◽

Vol 20 (1-4) ◽

pp. 25-37 ◽

Author(s):

See-Hyung Lee ◽

T. W. Noh

Keyword(s):

Optical Properties ◽

Pulsed Laser Deposition ◽

Nonlinear Optical ◽

Pulsed Laser ◽

Nonlinear Optical Properties ◽

Laser Deposition ◽

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Hard carbon and composite metal/hard carbon films prepared by a dc unbalanced planar magnetron

Vacuum ◽

10.1016/0042-207x(90)90039-2 ◽

1990 ◽

Vol 40 (3) ◽

pp. 251-255 ◽

Author(s):

H Biederman ◽

K Kohoutek ◽

Z Chmel ◽

V Stary ◽

RP Howson

Keyword(s):

Carbon Films ◽

Hard Carbon ◽

Planar Magnetron

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7175. Preparation of AIN films by planar magnetron sputtering system with facing two targets

Vacuum ◽

10.1016/0042-207x(91)90982-o ◽

1991 ◽

Vol 42 (8-9) ◽

pp. 567

Keyword(s):

Magnetron Sputtering ◽

Planar Magnetron ◽

Sputtering System

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Alucone Interlayers to Minimize Stress Caused by Thermal Expansion Mismatch between Al2O3 Films and Teflon Substrates

ACS Applied Materials & Interfaces ◽

10.1021/am303077x ◽

2013 ◽

Vol 5 (3) ◽

pp. 1165-1173 ◽

Author(s):

Shih-Hui Jen ◽

Steven M. George ◽

Robert S. McLean ◽

Peter F. Carcia

Keyword(s):

Thermal Expansion ◽

Thermal Expansion Mismatch ◽

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Space-charge-controlled field emission model of current conduction through Al2O3 films

Journal of Applied Physics ◽

10.1063/1.4941547 ◽

2016 ◽

Vol 119 (6) ◽

pp. 064505 ◽

Keyword(s):

Space Charge ◽

Field Emission ◽

Emission Model ◽

Current Conduction ◽

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Comparative bioelectrochemical study of two types of myoglobin layer-by-layer films with alumina: Vapor-surface sol–gel deposited Al2O3 films versus Al2O3 nanoparticle films

Electrochimica Acta ◽

10.1016/j.electacta.2006.04.002 ◽

2006 ◽

Vol 52 (1) ◽

pp. 123-132 ◽

Author(s):

Wei Guo ◽

Haiyun Lu ◽

Naifei Hu

Keyword(s):

Sol Gel ◽

Layer By Layer ◽

Nanoparticle Films ◽

Al2o3 Nanoparticle ◽

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Effect of pressure on dc planar magnetron sputtering of platinum

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1564027 ◽

2003 ◽

Vol 21 (3) ◽

pp. 572-576 ◽

Author(s):

John H. Thomas

Keyword(s):

Magnetron Sputtering ◽

Effect Of Pressure ◽

Planar Magnetron

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Molecular layer epitaxy of α-Al2O3 films

Journal of Crystal Growth ◽

10.1016/0022-0248(90)90585-9 ◽

1990 ◽

Vol 99 (1-4) ◽

pp. 572-576 ◽

Author(s):

Gin-ichiro Oya ◽

Yasuji Sawada

Keyword(s):

Molecular Layer ◽

Α Al2o3 ◽

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ChemInform Abstract: Selective Ion Beam Etching of Al2O3 Films.

10.1002/chin.199147294 ◽

2010 ◽

Vol 22 (47) ◽

pp. no-no

Author(s):

T. KAWABE ◽

M. FUYAMA ◽

S. NARISHIGE

Keyword(s):

Ion Beam ◽

Ion Beam Etching ◽

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