Journal of Vacuum Science and Technology
Latest Publications

TOTAL DOCUMENTS

5283

(FIVE YEARS 0)

H-INDEX

114

(FIVE YEARS 0)

Published By American Vacuum Society

0022-5355

Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Electron‐beam lithography three‐mark silicon automatic registration and its capabilities for process distortion compensation

Journal of Vacuum Science and Technology ◽

10.1116/1.571881 ◽

1982 ◽

Vol 21 (4) ◽

pp. 999-1004 ◽

Cited By ~ 1

Author(s):

Eric Tobias ◽

Allen Carroll

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Automatic Registration ◽

Distortion Compensation

Download Full-text

Physics and Applications of the Josephson Effect by A. Barone and G. Paterno

Journal of Vacuum Science and Technology ◽

10.1116/1.571869 ◽

1982 ◽

Vol 21 (4) ◽

pp. 1050-1051 ◽

Cited By ~ 2

Author(s):

Robert M. White

Keyword(s):

Josephson Effect

Download Full-text

Preparation of Nuclear Targets for Particle Accelerators edited by Jozef Jaklovsky

Journal of Vacuum Science and Technology ◽

10.1116/1.571868 ◽

1982 ◽

Vol 21 (4) ◽

pp. 1049-1050

Author(s):

H. L. Adair

Keyword(s):

Particle Accelerators ◽

Nuclear Targets

Download Full-text

MOS (Metal Oxide Semiconductors) Physics and Technology by E. H. Nicollian and J. R. Brews

Journal of Vacuum Science and Technology ◽

10.1116/1.571867 ◽

1982 ◽

Vol 21 (4) ◽

pp. 1048-1049 ◽

Cited By ~ 11

Author(s):

H. H. Wieder

Keyword(s):

Metal Oxide ◽

Metal Oxide Semiconductors ◽

Oxide Semiconductors

Download Full-text

Chlorine and hydrogen chloride on clean and oxygen‐covered Fe(100): Bonding and reactions

Journal of Vacuum Science and Technology ◽

10.1116/1.571871 ◽

1982 ◽

Vol 21 (4) ◽

pp. 945-951 ◽

Cited By ~ 5

Author(s):

N. C. Debnath ◽

Alfred B. Anderson

Keyword(s):

Hydrogen Chloride

Download Full-text

Cryopump regeneration studies

Journal of Vacuum Science and Technology ◽

10.1116/1.571855 ◽

1982 ◽

Vol 21 (4) ◽

pp. 1022-1027 ◽

Cited By ~ 14

Author(s):

R. C. Longsworth ◽

G. E. Bonney

Download Full-text

The effect of the atomic incident angle upon the microstructure of thick beryllium deposits produced by physical vapor deposition

Journal of Vacuum Science and Technology ◽

10.1116/1.571878 ◽

1982 ◽

Vol 21 (4) ◽

pp. 980-985 ◽

Cited By ~ 7

Author(s):

T. G. Nieh ◽

R. F. Karlak ◽

A. E. Vidoz

Keyword(s):

Vapor Deposition ◽

Physical Vapor Deposition ◽

Incident Angle

Download Full-text

Silicon nitride single‐layer x‐ray mask

Journal of Vacuum Science and Technology ◽

10.1116/1.571854 ◽

1982 ◽

Vol 21 (4) ◽

pp. 1017-1021 ◽

Cited By ~ 125

Author(s):

Misao Sekimoto ◽

Hideo Yoshihara ◽

Takashi Ohkubo

Keyword(s):

Silicon Nitride ◽

Single Layer ◽

X Ray

Download Full-text

Deposition rate dependence of the critical optimization temperature for thin film properties: Evidence for the disordered area reevaporation mechanism

Journal of Vacuum Science and Technology ◽

10.1116/1.571877 ◽

1982 ◽

Vol 21 (4) ◽

pp. 972-979 ◽

Cited By ~ 11

Author(s):

P. S. Vincett

Keyword(s):

Thin Film ◽

Deposition Rate ◽

Rate Dependence ◽

Film Properties

Download Full-text

Growth and surface properties of lanthanum hexaboride crystals

Journal of Vacuum Science and Technology ◽

10.1116/1.571872 ◽

1982 ◽

Vol 21 (4) ◽

pp. 952-956 ◽

Cited By ~ 3

Author(s):

Toru Inoue ◽

Mitsuru Nakada ◽

Takahiko Uozumi ◽

Eizi Sugata

Keyword(s):

Surface Properties ◽

Lanthanum Hexaboride

Download Full-text