Study of RLS trade-off mitigation utilizing a novel negative chemically amplified resist for high resolution patterning

2019 ◽  
Author(s):  
Satoshi Enomoto ◽  
Kohei Machida ◽  
Michiya Naito ◽  
Takahiro Kozawa
Keyword(s):  
High Resolution ◽  
Trade Off ◽  
Chemically Amplified ◽  
Chemically Amplified Resist

One-component chemically amplified resist composed of polymeric sulfonium salt PAGs for high resolution patterning

2019 ◽  
Vol 114 ◽  
pp. 11-18 ◽  
Author(s):  
Qianqian Wang ◽  
Chenying Zhang ◽  
Chenfeng Yan ◽  
Fengjuan You ◽  
Liyuan Wang
Keyword(s):  
High Resolution ◽  
Sulfonium Salt ◽  
Chemically Amplified ◽  
Chemically Amplified Resist

Negative tone chemically amplified resist formulation optimizations for ultra high-resolution lithography

2003 ◽  
Vol 67-68 ◽  
pp. 274-282 ◽  
Author(s):  
J. Saint-Pol ◽  
S. Landis ◽  
C. Gourgon ◽  
S. Tedesco ◽  
R. Hanawa ◽  
...  
Keyword(s):  
High Resolution ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Negative Tone

A New Chemically Amplified Resist for High Resolution Patterning by E-Beam Lithography

2010 ◽  
Vol 10 (11) ◽  
pp. 7130-7133 ◽  
Author(s):  
Bing-Rui Lu ◽  
Yifang Chen ◽  
Ejaz Huq ◽  
Xin-Ping Qu ◽  
Ran Liu
Keyword(s):  
High Resolution ◽  
Chemically Amplified ◽  
Chemically Amplified Resist
Sign in / Sign up

Export Citation Format

Share Document